Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11774142 | Double-line focusing solar energy collection apparatus | Ye Zhu | 2023-10-03 |
| 11692740 | Double point-focusing solar energy collection apparatus | Ye Zhu | 2023-07-04 |
| 11616873 | Communication device and output sidetone adjustment method thereof | Kuo-Wei KAO, Jian Li, Kuo-Ping Yang | 2023-03-28 |
| 11451916 | Sound adjustment method and sound adjustment device | Kuo-Wei KAO, Po-Jui WU, Yu-Chieh Huang, Wei-Lin Chang, Kai-Yuan Hsiao +2 more | 2022-09-20 |
| 10796708 | Method for eliminating sound and electronic device performing the same | Kuo-Wei KAO, Po-Jui WU, Jian Li, Kuo-Ping Yang | 2020-10-06 |
| 10658799 | Transmission cable and display system | Chih-Yang Hsu, Chien-Hung Chen, Heng-Chang CHANG, Chin-Lung Ting | 2020-05-19 |
| 10607591 | Sound playback device and method for masking interference sound through noise masking signal thereof | Kuo-Wei KAO, Yu-Chieh Huang, Wei-Lin Chang, I-Ting Lee, Kuo-Ping Yang | 2020-03-31 |
| 10474026 | Method for correcting bevel corners of a layout pattern | Kuei-Hsu Chou, Yung-Feng Cheng, Jing-Yi Lee | 2019-11-12 |
| 9785046 | Pattern verifying method | Te-Hsien Hsieh, Ming-Jui Chen, Jing-Yi Lee, Jian-Yuan Ma, Yan-Chun Chen | 2017-10-10 |
| 9262820 | Method and apparatus for integrated circuit design | Te-Hsien Hsieh, Ming-Jui Chen, Jing-Yi Lee | 2016-02-16 |
| 9171898 | Method for manufacturing semiconductor layout pattern, method for manufacturing semiconductor device, and semiconductor device | Yu-Shiang Yang | 2015-10-27 |
| 9104833 | Mask set for double exposure process and method of using the mask set | Hui-Fang Kuo, Ming-Jui Chen, Ting-Cheng Tseng | 2015-08-11 |
| 9047658 | Method of optical proximity correction | Te-Hsien Hsieh, Ming-Jui Chen, Ping-I Hsieh, Jing-Yi Lee | 2015-06-02 |
| 8885917 | Mask pattern and correcting method thereof | Te-Hsien Hsieh, Ming-Jui Chen, Jing-Yi Lee | 2014-11-11 |
| 8806391 | Method of optical proximity correction according to complexity of mask pattern | Te-Hsien Hsieh, Ming-Jui Chen, Shih-Ming Kuo, Jing-Yi Lee | 2014-08-12 |
| 8778604 | Mask set for double exposure process and method of using the mask set | Hui-Fang Kuo, Ming-Jui Chen, Ting-Cheng Tseng | 2014-07-15 |
| 8745547 | Method for making photomask layout | Shih-Ming Kuo, Ming-Jui Chen, Te-Hsien Hsieh, Jing-Yi Lee | 2014-06-03 |
| 8701052 | Method of optical proximity correction in combination with double patterning technique | Hui-Fang Kuo, Ming-Jui Chen | 2014-04-15 |
| 8627242 | Method for making photomask layout | Hui-Fang Kuo, Ming-Jui Chen | 2014-01-07 |
| 8383299 | Double patterning mask set and method of forming thereof | Te-Hsien Hsieh, Ming-Jui Chen, Shih-Ming Kuo, Ping-I Hsieh, Jing-Yi Lee | 2013-02-26 |
| 8225237 | Method to determine process window | Te-Hung Wu, Sheng-Yuan Huang, Chia-Wei Huang, Ping-I Hsieh, Po-I Lee +2 more | 2012-07-17 |