Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11934106 | Optical proximity correction device and method | Shu-Yen Liu, Chian-Ting Huang, Wei-Cyuan Lo, Yung-Feng Cheng, Chung-Yi Chiu | 2024-03-19 |
| 9104833 | Mask set for double exposure process and method of using the mask set | Ming-Jui Chen, Ting-Cheng Tseng, Cheng-Te Wang | 2015-08-11 |
| 8930858 | Method for optical proximity correction | Ming-Jui Chen | 2015-01-06 |
| 8778604 | Mask set for double exposure process and method of using the mask set | Ming-Jui Chen, Ting-Cheng Tseng, Cheng-Te Wang | 2014-07-15 |
| 8701052 | Method of optical proximity correction in combination with double patterning technique | Ming-Jui Chen, Cheng-Te Wang | 2014-04-15 |
| 8627242 | Method for making photomask layout | Ming-Jui Chen, Cheng-Te Wang | 2014-01-07 |
| 8423923 | Optical proximity correction method | Chia-Wei Huang, Ming-Jui Chen, Ting-Cheng Tseng | 2013-04-16 |
| 8042069 | Method for selectively amending layout patterns | Yu-Shiang Yang, Te-Hung Wu, Yung-Feng Cheng, Chuen-Huei Yang, Hsiang-Yun Huang +2 more | 2011-10-18 |
| 7943274 | Mask pattern correction and layout method | Yu-Shiang Yang | 2011-05-17 |
| 7797656 | Method of checking and correcting mask pattern | Yu-Shiang Yang | 2010-09-14 |