| 9524361 |
Method for decomposing a layout of an integrated circuit |
Ming-Jui Chen, Chia-Wei Huang |
2016-12-20 |
| 9368365 |
Method for forming a semiconductor structure |
Shih-Hsun Kuo, Tan-Ya Yin, Chia-Wei Huang, Ming-Jui Chen |
2016-06-14 |
| 9104833 |
Mask set for double exposure process and method of using the mask set |
Hui-Fang Kuo, Ming-Jui Chen, Cheng-Te Wang |
2015-08-11 |
| 8822328 |
Method for patterning semiconductor structure |
Chia-Wei Huang, Ming-Jui Chen, Ping-I Hsieh |
2014-09-02 |
| 8778604 |
Mask set for double exposure process and method of using the mask set |
Hui-Fang Kuo, Ming-Jui Chen, Cheng-Te Wang |
2014-07-15 |
| 8741507 |
Method for separating photomask pattern |
Chun-Hsien Huang, Ming-Jui Chen, Chia-Wei Huang |
2014-06-03 |
| 8608504 |
Connector and connector assembly used for transmitting low-speed signal and/or high-speed signal |
— |
2013-12-17 |
| 8470655 |
Method for designing stressor pattern |
Chun-Hsien Huang, Ming-Jui Chen, Chia-Wei Huang |
2013-06-25 |
| 8423923 |
Optical proximity correction method |
Chia-Wei Huang, Ming-Jui Chen, Hui-Fang Kuo |
2013-04-16 |