| 9747404 |
Method for optimizing an integrated circuit layout design |
Shih-Ming Kuo, Ming-Jui Chen, Te-Hsien Hsieh, Jing-Yi Lee, Yan-Chun Chen |
2017-08-29 |
| 9047658 |
Method of optical proximity correction |
Te-Hsien Hsieh, Ming-Jui Chen, Cheng-Te Wang, Jing-Yi Lee |
2015-06-02 |
| 8822328 |
Method for patterning semiconductor structure |
Chia-Wei Huang, Ming-Jui Chen, Ting-Cheng Tseng |
2014-09-02 |
| 8383299 |
Double patterning mask set and method of forming thereof |
Te-Hsien Hsieh, Ming-Jui Chen, Shih-Ming Kuo, Cheng-Te Wang, Jing-Yi Lee |
2013-02-26 |
| 8225237 |
Method to determine process window |
Te-Hung Wu, Sheng-Yuan Huang, Cheng-Te Wang, Chia-Wei Huang, Po-I Lee +2 more |
2012-07-17 |
| 7886254 |
Method for amending layout patterns |
Chia-Wei Huang, Te-Hung Wu, Pei-Ru Tsai |
2011-02-08 |