Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8321820 | Method to compensate optical proximity correction | Chun-Hsien Huang, Ming-Jui Chen, Yu-Shiang Yang | 2012-11-27 |
| 8321822 | Method and computer-readable medium of optical proximity correction | Yu-Shiang Yang, Ming-Jui Chen | 2012-11-27 |
| 8225237 | Method to determine process window | Sheng-Yuan Huang, Cheng-Te Wang, Chia-Wei Huang, Ping-I Hsieh, Po-I Lee +2 more | 2012-07-17 |
| 8166424 | Method for constructing OPC model | Chuen-Huei Yang | 2012-04-24 |
| 8151221 | Method to compensate optical proximity correction | Chun-Hsien Huang, Ming-Jui Chen, Yu-Shiang Yang | 2012-04-03 |
| 8042069 | Method for selectively amending layout patterns | Yu-Shiang Yang, Yung-Feng Cheng, Chuen-Huei Yang, Hsiang-Yun Huang, Hui-Fang Kuo +2 more | 2011-10-18 |
| 7913196 | Method of verifying a layout pattern | Chia-Wei Huang, Chuen-Huei Yang, Sheng-Yuan Huang, Pei-Ru Tsai, Chih-Hao Wu | 2011-03-22 |
| 7886254 | Method for amending layout patterns | Chia-Wei Huang, Pei-Ru Tsai, Ping-I Hsieh | 2011-02-08 |
| 7669153 | Method for correcting photomask pattern | Chuen-Huei Yang, Sheng-Yuan Huang, Chia-Wei Huang, Pei-Ru Tsai | 2010-02-23 |
| 7664614 | Method of inspecting photomask defect | Shih-Ming Yen, Chih-Hao Wu, Chuen-Huei Yang | 2010-02-16 |
| 6536130 | Overlay mark for concurrently monitoring alignment accuracy, focus, leveling and astigmatism and method of application thereof | Jung-Yu Hsieh, Hsiu-Man Chang | 2003-03-25 |