| 8321820 |
Method to compensate optical proximity correction |
Chun-Hsien Huang, Ming-Jui Chen, Yu-Shiang Yang |
2012-11-27 |
| 8321822 |
Method and computer-readable medium of optical proximity correction |
Yu-Shiang Yang, Ming-Jui Chen |
2012-11-27 |
| 8225237 |
Method to determine process window |
Sheng-Yuan Huang, Cheng-Te Wang, Chia-Wei Huang, Ping-I Hsieh, Po-I Lee +2 more |
2012-07-17 |
| 8166424 |
Method for constructing OPC model |
Chuen-Huei Yang |
2012-04-24 |
| 8151221 |
Method to compensate optical proximity correction |
Chun-Hsien Huang, Ming-Jui Chen, Yu-Shiang Yang |
2012-04-03 |
| 8042069 |
Method for selectively amending layout patterns |
Yu-Shiang Yang, Yung-Feng Cheng, Chuen-Huei Yang, Hsiang-Yun Huang, Hui-Fang Kuo +2 more |
2011-10-18 |
| 7913196 |
Method of verifying a layout pattern |
Chia-Wei Huang, Chuen-Huei Yang, Sheng-Yuan Huang, Pei-Ru Tsai, Chih-Hao Wu |
2011-03-22 |
| 7886254 |
Method for amending layout patterns |
Chia-Wei Huang, Pei-Ru Tsai, Ping-I Hsieh |
2011-02-08 |
| 7669153 |
Method for correcting photomask pattern |
Chuen-Huei Yang, Sheng-Yuan Huang, Chia-Wei Huang, Pei-Ru Tsai |
2010-02-23 |
| 7664614 |
Method of inspecting photomask defect |
Shih-Ming Yen, Chih-Hao Wu, Chuen-Huei Yang |
2010-02-16 |
| 6536130 |
Overlay mark for concurrently monitoring alignment accuracy, focus, leveling and astigmatism and method of application thereof |
Jung-Yu Hsieh, Hsiu-Man Chang |
2003-03-25 |