Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8225237 | Method to determine process window | Te-Hung Wu, Sheng-Yuan Huang, Cheng-Te Wang, Chia-Wei Huang, Ping-I Hsieh +2 more | 2012-07-17 |
| 8166424 | Method for constructing OPC model | Te-Hung Wu | 2012-04-24 |
| 8042069 | Method for selectively amending layout patterns | Yu-Shiang Yang, Te-Hung Wu, Yung-Feng Cheng, Hsiang-Yun Huang, Hui-Fang Kuo +2 more | 2011-10-18 |
| 7913196 | Method of verifying a layout pattern | Te-Hung Wu, Chia-Wei Huang, Sheng-Yuan Huang, Pei-Ru Tsai, Chih-Hao Wu | 2011-03-22 |
| 7687206 | Mask pattern and method for forming the same | Chuan-Hsien Fu, Chien-Li Kuo, Shu-Ru Wang, Yu-Lin Wang | 2010-03-30 |
| 7669153 | Method for correcting photomask pattern | Te-Hung Wu, Sheng-Yuan Huang, Chia-Wei Huang, Pei-Ru Tsai | 2010-02-23 |
| 7664614 | Method of inspecting photomask defect | Te-Hung Wu, Shih-Ming Yen, Chih-Hao Wu | 2010-02-16 |
| 7312020 | Lithography method | Chin-Lung Lin, Ming-Jui Chen, Venson Lee | 2007-12-25 |
| 7141337 | Phase shift mask | Chin-Lung Lin, Ming-Jui Chen, Wen-Tien Hung | 2006-11-28 |
| 7008732 | Photomask pattern | Chin-Lung Lin, Wen-Tien Hung | 2006-03-07 |
| 5916717 | Process utilizing relationship between reflectivity and resist thickness for inhibition of side effect caused by halftone phase shift masks | Chang-Ming Dai | 1999-06-29 |
| D396338 | Scarf | — | 1998-07-28 |