Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12371813 | Silicon wafer and method for producing silicon wafer | Haruo Sudo, Takashi Ishikawa, Hisashi Matsumura, Tatsuhiko Aoki, Shoji Ikeda +2 more | 2025-07-29 |
| 11887845 | Method for producing three-dimensional structure, method for producing vertical transistor, vertical transistor wafer, and vertical transistor substrate | Kazutaka KAMIJO, Etsuo Fukuda, Takashi Ishikawa, Moriya Miyashita, Takao Sakamoto +1 more | 2024-01-30 |
| 8999864 | Silicon wafer and method for heat-treating silicon wafer | Takeshi Senda, Hiromichi Isogai, Eiji Toyoda, Koji Araki, Tatsuhiko Aoki +4 more | 2015-04-07 |
| 8476149 | Method of manufacturing single crystal silicon wafer from ingot grown by Czocharlski process with rapid heating/cooling process | Hiromichi Isogai, Takeshi Senda, Eiji Toyoda, Kumiko Murayama, Susumu Maeda +7 more | 2013-07-02 |
| 8399341 | Method for heat treating a silicon wafer | Takeshi Senda, Hiromichi Isogai, Eiji Toyoda, Kumiko Murayama, Koji Araki +4 more | 2013-03-19 |
| 8252700 | Method of heat treating silicon wafer | Takeshi Senda, Hiromichi Isogai, Eiji Toyoda, Kumiko Murayama, Koji Araki +4 more | 2012-08-28 |
| 7977219 | Manufacturing method for silicon wafer | Hiromichi Isogai, Takeshi Senda, Eiji Toyoda, Kumiko Murayama, Susumu Maeda +1 more | 2011-07-12 |
| 7679730 | Surface inspection apparatus and surface inspection method for strained silicon wafer | Hideaki Takano, Miyuki Shimizu, Takeshi Senda, Yoshinori Hayashi, Kazuhiko Hamatani | 2010-03-16 |
| 7403278 | Surface inspection apparatus and surface inspection method | Yoshinori Hayashi, Hiroyuki Naraidate, Makoto Kyoya, Hiromi Nagahama, Miyuki Shimizu +1 more | 2008-07-22 |
| 7250357 | Manufacturing method for strained silicon wafer | Takeshi Senda | 2007-07-31 |
| 7247583 | Manufacturing method for strained silicon wafer | Hisatsugu Kurita, Masato Igarashi, Takeshi Senda | 2007-07-24 |
| 7193294 | Semiconductor substrate comprising a support substrate which comprises a gettering site | Reiko Yoshimura, Tsukasa Tada, Kazuhiko Kashima | 2007-03-20 |
| 7149341 | Wafer inspection apparatus | Yoshinori Hayashi, Hiroyuki Naraidate, Hiroaki Yuda, Atsushi Tanabe, Hiromichi Isogai | 2006-12-12 |
| 7060597 | Manufacturing method for a silicon substrate having strained layer | Hisatsugu Kurita, Masato Igarashi, Takeshi Senda | 2006-06-13 |
| 5704974 | Growth of silicon crystal from melt having extraordinary eddy flows on its surface | Souroku Kawanishi, Shinji Togawa, Atsushi Ikari, Hitoshi Sasaki, Shigeyuki Kimura | 1998-01-06 |
| 5700320 | Growth of silicon single crystal having uniform impurity distribution along lengthwise or radial direction | Souroku Kawanishi, Shinji Togawa, Atsushi Ikari, Hitoshi Sasaki, Shigeyuki Kimura | 1997-12-23 |
| 5683504 | Growth of silicon single crystal | Souroku Kawanishi, Shinji Togawa, Atsushi Ikari, Hitoshi Sasaki, Shigeyuki Kimura | 1997-11-04 |
| 5477805 | Preparation of silicon melt for use in pull method of manufacturing single crystal | Xin ming Huang, Kazutaka Terashima, Shigeyuki Kimura | 1995-12-26 |