DS

Daiju Shiono

TC Tokyo Ohka Kogyo Co.: 64 patents #4 of 684Top 1%
HI Hitachi: 1 patents #17,742 of 28,497Top 65%
TT Tokyo Institute Of Technology: 1 patents #411 of 1,159Top 40%
Overall (All Time): #34,903 of 4,157,543Top 1%
64
Patents All Time

Issued Patents All Time

Showing 26–50 of 64 patents

Patent #TitleCo-InventorsDate
8586288 Method of forming resist pattern Tomoyuki Hirano 2013-11-19
8541529 Positive resist composition, method of forming resist pattern, and polymeric compound Takahiro Dazai, Tomoyuki Hirano, Tasuku Matsumiya 2013-09-24
8487056 Positive resist composition and method of forming resist pattern Tasuku Matsumiya, Tomoyuki Hirano, Takahiro Dazai, Kotaro Endo 2013-07-16
8475997 Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound Tomoyuki Hirano, Sanae Furuya, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa +2 more 2013-07-02
8450044 Positive resist composition and method of forming resist pattern Tomoyuki Hirano, Daichi Takaki 2013-05-28
8440385 Positive resist composition, method of forming resist pattern and polymeric compound Tomoyuki Hirano, Masatoshi Arai 2013-05-14
8404428 Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound Tasuku Matsumiya, Tomoyuki Hirano, Takahiro Dazai 2013-03-26
8404426 Negative resist composition, method of forming resist pattern and polymeric compound Sho Abe, Tomoyuki Hirano, Takahiro Dazai 2013-03-26
8394578 Method of forming resist pattern and negative tone-development resist composition Tomoyuki Hirano, Takahiro Dazai 2013-03-12
8389197 Compound, positive resist composition and resist pattern forming method Takako Hirosaki, Taku Hirayama, Hideo Hada 2013-03-05
8367296 Positive resist composition, method of forming resist pattern, and polymeric compound Tomoyuki Hirano, Takahiro Dazai, Tasuku Matsumiya 2013-02-05
8329378 Positive resist composition, method of forming resist pattern, and polymeric compound Tomoyuki Hirano, Tasuku Matsumiya, Takahiro Dazai 2012-12-11
8304163 Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern Taku Hirayama, Toshiyuki Ogata, Shogo Matsumaru, Hideo Hada 2012-11-06
8268529 Positive resist composition, method of forming resist pattern using the same, and polymeric compound Takahiro Dazai, Tomoyuki Hirano, Tasuku Matsumiya, Masaru Takeshita 2012-09-18
8257903 Compound, positive resist composition and method for formation of resist pattern Hideo Hada 2012-09-04
8236477 Positive resist composition and method of forming resist pattern Tasuku Matsumiya, Tomoyuki Hirano, Takahiro Dazai, Kotaro Endo 2012-08-07
8232041 Positive resist composition, method of forming resist pattern, and polymeric compound Takahiro Dazai, Tomoyuki Hirano, Tasuku Matsumiya 2012-07-31
8227170 Resist composition, method of forming resist pattern, polymeric compound, and compound Takahiro Dazai, Tomoyuki Hirano, Tasuku Matsumiya, Daichi Takaki, Takayoshi Mori +1 more 2012-07-24
8221956 Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound Tomoyuki Hirano, Sanae Furuya, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa +2 more 2012-07-17
8206887 Positive resist composition and resist pattern forming method Takako Hirosaki, Taku Hirayama 2012-06-26
8192915 Positive resist composition, method of forming resist pattern, and polymeric compound Takahiro Dazai, Tomoyuki Hirano, Tasuku Matsumiya 2012-06-05
8182976 Positive resist composition, method of forming resist pattern, and polymeric compound Takahiro Dazai, Tomoyuki Hirano, Tasuku Matsumiya 2012-05-22
8088553 Positive resist composition, method of forming resist pattern, and polymeric compound Hiroaki Shimizu, Tsuyoshi Nakamura, Takayoshi Mori, Sanae Furuya, Tomoyuki Hirano +1 more 2012-01-03
8021823 Positive resist composition, method of forming resist pattern, and polymeric compound Hiroaki Shimizu, Tsuyoshi Nakamura, Takahiro Dazai, Tomoyuki Hirano 2011-09-20
8017300 Compound, positive resist composition and method for forming resist pattern Taku Hirayama, Hideo Hada 2011-09-13