Issued Patents All Time
Showing 51–75 of 86 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6532975 | Substrate processing apparatus and substrate processing method | Kouji Egashira, Koji Tanaka | 2003-03-18 |
| 6510859 | Apparatus and method for cleaning and drying object | — | 2003-01-28 |
| 6495215 | Method and apparatus for processing substrate | — | 2002-12-17 |
| 6491045 | Apparatus for and method of cleaning object to be processed | Kinya Ueno, Satoshi Nakashima | 2002-12-10 |
| 6435199 | Treatment apparatus | — | 2002-08-20 |
| 6413355 | Apparatus for and method of cleaning objects to be processed | Satoshi Nakashima, Kinya Ueno | 2002-07-02 |
| 6394110 | Substrate processing apparatus and substrate processing method | Shigenori Kitahara, Kinya Ueno | 2002-05-28 |
| 6375758 | Cleaning and drying method and apparatus for objects to be processed | Satoshi Nakashima, Kazuyuki Honda | 2002-04-23 |
| 6357458 | Cleaning apparatus and cleaning method | Hiroshi Tanaka, Shinichiro Shimomura | 2002-03-19 |
| 6342104 | Method of cleaning objects to be processed | Satoshi Nakashima, Kinya Ueno | 2002-01-29 |
| 6319329 | Method of cleaning objects to be processed | Kinya Ueno, Satoshi Nakashima | 2001-11-20 |
| 6318386 | Treatment apparatus | Naoki Shindo, Shigenori Kitahara | 2001-11-20 |
| 6299696 | Substrate processing apparatus and substrate processing method | Shigenori Kitahara, Kinya Ueno | 2001-10-09 |
| 6247479 | Washing/drying process apparatus and washing/drying process method | Hiroki Taniyama, Kotaro Tsurusaki | 2001-06-19 |
| 6241827 | Method for cleaning a workpiece | Hiroshi Tanaka, Shinichiro Shimomura | 2001-06-05 |
| 6171403 | Cleaning and drying apparatus, wafer processing system and wafer processing method | Osamu Kuroda, Kenji Soejima, Tsuyoshi Nomura | 2001-01-09 |
| 6164297 | Cleaning and drying apparatus for objects to be processed | — | 2000-12-26 |
| 6158449 | Cleaning and drying method and apparatus | — | 2000-12-12 |
| 6158447 | Cleaning method and cleaning equipment | Naoki Shindo, Shigenori Kitahara, Miyako Yamasaka | 2000-12-12 |
| 6131588 | Apparatus for and method of cleaning object to be processed | Kinya Ueno, Satoshi Nakashima | 2000-10-17 |
| 6119367 | System for drying semiconductor wafers using ultrasonic or low frequency vibration | Satoshi Nakashima | 2000-09-19 |
| 6109278 | Liquid treatment method and apparatus | Naoki Shindo, Miyako Yamasaka | 2000-08-29 |
| 6082381 | Treatment apparatus | Naoki Shindo, Shigenori Kitahara | 2000-07-04 |
| 6068002 | Cleaning and drying apparatus, wafer processing system and wafer processing method | Osamu Kuroda, Kenji Soejima, Tsuyoshi Nomura | 2000-05-30 |
| 6050275 | Apparatus for and method of cleaning objects to be processed | Satoshi Nakashima, Kinya Ueno | 2000-04-18 |