Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12191114 | Semiconductor reaction chamber and atomic layer plasma etching apparatus | Xingfei MAO, Gang Wei, Guodong Chen | 2025-01-07 |
| 9153465 | Substrate stage, substrate processing apparatus and substrate processing system | Yusuke Muraki, Jin Fujihara | 2015-10-06 |
| 8968475 | Substrate processing apparatus | Shigeki Tozawa, Hajime Ugajin | 2015-03-03 |
| 8741065 | Substrate processing apparatus | Yusuke Muraki, Jin Fujihara | 2014-06-03 |
| 8175736 | Method and system for performing a chemical oxide removal process | Masayuki Tomoyasu, Merritt Funk, Kevin Pinto, Lemuel Chen, Asao Yamashita +2 more | 2012-05-08 |
| 7877161 | Method and system for performing a chemical oxide removal process | Masayuki Tomoyasu, Merritt Funk, Kevin Pinto, Lemuel Chen, Asao Yamashita +2 more | 2011-01-25 |