MH

Manabu Honma

TL Tokyo Electron Limited: 55 patents #43 of 5,567Top 1%
📍 Oshu, JP: #1 of 53 inventorsTop 2%
Overall (All Time): #45,258 of 4,157,543Top 2%
55
Patents All Time

Issued Patents All Time

Showing 26–50 of 55 patents

Patent #TitleCo-InventorsDate
8961691 Film deposition apparatus, film deposition method, computer readable storage medium for storing a program causing the apparatus to perform the method Hitoshi Kato, Kazuteru Obara 2015-02-24
8944077 Film deposition apparatus, cleaning method for the same, and computer storage medium storing program Hitoshi Kato 2015-02-03
8882915 Film deposition apparatus, film deposition method, and computer readable storage medium Hitoshi Kato, Hiroyuki Kikuchi 2014-11-11
8854449 Substrate position detection apparatus, film deposition apparatus equipped with the same, and substrate position detection method Katsuyoshi Aikawa 2014-10-07
8845857 Substrate processing apparatus Yukio Ohizumi 2014-09-30
8840727 Film deposition apparatus, substrate processor, film deposition method, and computer-readable storage medium Hitoshi Kato 2014-09-23
8808456 Film deposition apparatus and substrate process apparatus Hitoshi Kato 2014-08-19
8746170 Substrate process apparatus, substrate process method, and computer readable storage medium Kohichi Orito, Tatsuya Tamura 2014-06-10
8721790 Film deposition apparatus Hitoshi Kato, Kohichi Orito, Yasushi Takeuchi, Hiroyuki Kikuchi 2014-05-13
8673079 Film deposition apparatus and substrate processing apparatus Hitoshi Kato, Tomoki Haneishi 2014-03-18
8673395 Film deposition apparatus, film deposition method, and storage medium Hitoshi Kato 2014-03-18
8518183 Film deposition apparatus, substrate process apparatus, film deposition method, and computer readable storage medium 2013-08-27
8465592 Film deposition apparatus Hitoshi Kato, Anthony Dip 2013-06-18
8465591 Film deposition apparatus Hitoshi Kato, Anthony Dip 2013-06-18
8372202 Film deposition apparatus Hitoshi Kato 2013-02-12
D655257 Top plate for reactor for manufacturing semiconductor Katsuyuki Hishiya 2012-03-06
D655262 Side wall for reactor for manufacturing semiconductor Katsuyuki Hishiya 2012-03-06
D655259 Top plate for reactor for manufacturing semiconductor Katsuyuki Hishiya 2012-03-06
D655260 Gas-separating plate for reactor for manufacturing semiconductor Katsuyuki Hishiya 2012-03-06
D655261 Gas-separating plate for reactor for manufacturing semiconductor Katsuyuki Hishiya 2012-03-06
D655258 Side wall for reactor for manufacturing semiconductor Katsuyuki Hishiya 2012-03-06
D654883 Top plate for reactor for manufacturing semiconductor Katsuyuki Hishiya 2012-02-28
D654884 Top plate for reactor for manufacturing semiconductor Katsuyuki Hishiya 2012-02-28
D654882 Gas-separating plate for reactor for manufacturing semiconductor Katsuyuki Hishiya 2012-02-28
8034723 Film deposition apparatus and film deposition method Yukio Ohizumi 2011-10-11