Issued Patents All Time
Showing 51–69 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7067434 | Hydrogen free integration of high-k gate dielectrics | Luigi Colombo, Mark Visokay | 2006-06-27 |
| 7026218 | Use of indium to define work function of p-type doped polysilicon | Antonio Luis Pacheco Rotondaro, Amitabh Jain | 2006-04-11 |
| 7015088 | High-K gate dielectric defect gettering using dopants | Luigi Colombo, Antonio Luis Pacheco Rotondaro | 2006-03-21 |
| 7005365 | Structure and method to fabricate self-aligned transistors with dual work function metal gate electrodes | — | 2006-02-28 |
| 6979623 | Method for fabricating split gate transistor device having high-k dielectrics | Antonio Luis Pacheco Rotondaro, Mark Visokay, Luigi Colombo | 2005-12-27 |
| 6969644 | Versatile system for triple-gated transistors with engineered corners | Mark Visokay | 2005-11-29 |
| 6946377 | Multiple-gate MOSFET device with lithography independent silicon body thickness and methods for fabricating the same | — | 2005-09-20 |
| 6936508 | Metal gate MOS transistors and methods for making the same | Mark Visokay, Luigi Colombo | 2005-08-30 |
| 6927106 | Methods for fabricating a triple-gate MOSFET transistor | Mark Visokay | 2005-08-09 |
| 6852645 | High temperature interface layer growth for high-k gate dielectric | Luigi Colombo, Antonio Luis Pacheco Rotondaro, Mark Visokay | 2005-02-08 |
| 6828200 | Multistage deposition that incorporates nitrogen via an intermediate step | Mark Visokay, Luigi Colombo | 2004-12-07 |
| 6809370 | High-k gate dielectric with uniform nitrogen profile and methods for making the same | Luigi Colombo, Manuel Quevedo-Lopez, Mark Visokay, Antonio Luis Pacheco Rotondaro | 2004-10-26 |
| 6803611 | Use of indium to define work function of p-type doped polysilicon | Antonio Luis Pacheco Rotondaro, Amitabh Jain | 2004-10-12 |
| 6780719 | Method for annealing ultra-thin, high quality gate oxide layers using oxidizer/hydrogen mixtures | Hiroaki Niimi, Rajesh Khamankar, Sunil Hattangady, Antonio Luis Pacheco Rotondaro | 2004-08-24 |
| 6762114 | Methods for transistor gate fabrication and for reducing high-k gate dielectric roughness | — | 2004-07-13 |
| 6750126 | Methods for sputter deposition of high-k dielectric films | Mark Visokay, Luigi Colombo, Antonio Luis Pacheco Rotondaro | 2004-06-15 |
| 6656852 | Method for the selective removal of high-k dielectrics | Antonio Luis Pacheco Rotondaro | 2003-12-02 |
| 6521911 | High dielectric constant metal silicates formed by controlled metal-surface reactions | Gregory N. Parsons, M. Jason Kelly | 2003-02-18 |
| 6503846 | Temperature spike for uniform nitridization of ultra-thin silicon dioxide layers in transistor gates | Hiroaki Niimi, Rajesh Khamankar, Douglas T. Grider | 2003-01-07 |