Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8349680 | High-k metal gate CMOS patterning method | Kong-Beng Thei, Harry-Hak-Lay Chuang, Ryan Chia-Jen Chen, Su-Chen Lai, Yi-Hsing Chen +2 more | 2013-01-08 |
| 8048752 | Spacer shape engineering for void-free gap-filling process | Ming-Yuan Wu, Chih-Tang Peng, Chiung-Han Yeh, Kong-Beng Thei, Harry-Hak-Lay Chuang +1 more | 2011-11-01 |
| 8003507 | Method of integrating high-K/metal gate in CMOS process flow | Ryan Chia-Jen Chen, Yih-Ann Lin, Jr-Jung Lin, Chien-Hao Chen, Kuo-Tai Huang +1 more | 2011-08-23 |
| 7947591 | Semiconductor devices with dual-metal gate structures and fabrication methods thereof | Peng-Fu Hsu, Fong-Yu Yen, Huan-Just Lin, Ying Jin, Hun-Jan Tao | 2011-05-24 |
| 7382028 | Method for forming silicide and semiconductor device formed thereby | Tung-Heng Hsieh, Chien-Li Cheng, Yung-Shun Chen | 2008-06-03 |
| 7378713 | Semiconductor devices with dual-metal gate structures and fabrication methods thereof | Peng-Fu Hsu, Fong-Yu Yen, Huan-Just Lin, Ying Jin, Hun-Jan Tao | 2008-05-27 |
| 6979654 | Method of avoiding dielectric layer deterioation with a low dielectric constant during a stripping process | Ting-Chang Chang, Po-Tsun Liu | 2005-12-27 |
| 6635967 | Air gap semiconductor structure and method of manufacture | Ting-Chang Chang, Po-Tsun Liu | 2003-10-21 |
| 6583067 | Method of avoiding dielectric layer deterioration with a low dielectric constant | Ting-Chang Chang, Po-Tsun Liu | 2003-06-24 |
| 6521547 | Method of repairing a low dielectric constant material layer | Ting-Chang Chang, Po-Tsun Liu | 2003-02-18 |
| 6498070 | Air gap semiconductor structure and method of manufacture | Ting-Chang Chang, Po-Tsun Liu | 2002-12-24 |
| 6423652 | Post-processing treatment of low dielectric constant material | Ting-Chang Chang, Po-Tsun Liu | 2002-07-23 |
| 6316347 | Air gap semiconductor structure and method of manufacture | Ting-Chang Chang, Po-Tsun Liu | 2001-11-13 |