Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9733577 | Intra-field process control for lithography | Ai-Jen Hung, Chen-Yen Huang, Yen-Di Tsen | 2017-08-15 |
| 9646896 | Lithographic overlay sampling | Yi-Ping Hsieh, Yung-Yao Lee, Ying-Ying Wang | 2017-05-09 |
| 9588446 | Calibration apparatus and an adjustment method for a lithography apparatus | Chen-Yen Huang, Ai-Jen Hung, Yen-Di Tsen | 2017-03-07 |
| 9477219 | Dynamic compensation in advanced process control | Chih-Wei Hsu, Jin-Ning Sung, Jong-I Mou | 2016-10-25 |
| 9442392 | Scanner overlay correction system and method | Yen-Di Tsen, Yi-Ping Hsieh, Chen-Yen Huang, Jong-I Mou | 2016-09-13 |
| 9082661 | Scanner overlay correction system and method | Yen-Di Tsen, Jong-I Mou | 2015-07-14 |
| 8889434 | Scanner overlay correction system and method | Yen-Di Tsen, Jong-I Mou | 2014-11-18 |
| 8867018 | Method and system for improved overlay correction | Tsai-Fu Ou, Wen-Yao Hsieh | 2014-10-21 |
| 8288063 | Defense system in advanced process control | Chih-Ming Hong, Yen-Di Tsen | 2012-10-16 |
| 8239056 | Advanced process control for new tapeout product | Chih-Wei Hsu, Yu-Jen Cheng, Wen-Pin Liu, Shun-Ping Wang, Jo Fei Wang +3 more | 2012-08-07 |
| 7687211 | System and method for photolithography in semiconductor manufacturing | Shui-Tien Lin, Yi-Chuan Lo | 2010-03-30 |
| 7494928 | Method for patterning and etching a passivation layer | Kun-Hong Lin | 2009-02-24 |
| 6943124 | Two step exposure to strengthen structure of polyimide or negative tone photosensitive material | Ho-Ku Lan | 2005-09-13 |