MI

Mohammed Rabiul Islam

TSMC: 11 patents #2,595 of 12,232Top 25%
Motorola: 6 patents #1,752 of 12,470Top 15%
TI Texas Instruments: 1 patents #7,357 of 12,488Top 60%
🗺 Texas: #7,815 of 125,132 inventorsTop 7%
Overall (All Time): #244,369 of 4,157,543Top 6%
18
Patents All Time

Issued Patents All Time

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
12265258 Structures and methods for high speed interconnection in photonic systems Weiwei Song, Stefan Rusu 2025-04-01
12223247 Logic cell structures and related methods Kumar Lalgudi, Ranjith Kumar, Jianyang Xu 2025-02-11
12181724 Apparatus and methods for optical interconnects Stefan Rusu, Wei-wei SONG, Chih-Tsung Shih 2024-12-31
12092862 Photonic semiconductor device and method Stefan Rusu, Weiwei Song 2024-09-17
12046580 Three-dimensional integrated circuit (3D IC) low-dropout (LDO) regulator power delivery Stefan Rusu, Eric Soenen 2024-07-23
11966090 Heterogeneous packaging integration of photonic and electronic elements Stefan Rusu, Wei-wei SONG 2024-04-23
11816412 Logic cell structures and related methods Kumar Lalgudi, Ranjith Kumar, Jianyang Xu 2023-11-14
11808977 Structures and methods for high speed interconnection in photonic systems Weiwei Song, Stefan Rusu 2023-11-07
11703639 Photonic semiconductor device and method Stefan Rusu, Weiwei Song 2023-07-18
11550102 Structures and methods for high speed interconnection in photonic systems Weiwei Song, Stefan Rusu 2023-01-10
11215753 Photonic semiconductor device and method Stefan Rusu, Weiwei Song 2022-01-04
7894517 Self-calibrated adaptive equalization system and methods of performing the same Hao Liu, Yanli Fan, Mark W. Morgan 2011-02-22
6573173 Method for forming a copper interconnect using a multi-platen chemical mechanical polishing (CMP) process János Farkas, Brian G. Anthony, Abbas Guvenilir, Venkat R. Kolagunta, John Mendonca +2 more 2003-06-03
6551919 Method for forming a dual inlaid copper interconnect structure Suresh Venkatesan, Bradley P. Smith 2003-04-22
6444569 Method for forming a copper interconnect using a multi-platen chemical mechanical polishing (CMP) process János Farkas, Brian G. Anthony, Abbas Guvenilir, Venkat R. Kolagunta, John Mendonca +2 more 2002-09-03
6326301 Method for forming a dual inlaid copper interconnect structure Suresh Venkatesan, Bradley P. Smith 2001-12-04
6297155 Method for forming a copper layer over a semiconductor wafer Cindy Reidsema Simpson, Robert D. Mikkola, Matthew T. Herrick, Brett Baker, David Moralez Pena +4 more 2001-10-02
6274478 Method for forming a copper interconnect using a multi-platen chemical mechanical polishing (CMP) process János Farkas, Brian G. Anthony, Abbas Guvenilir, Venkat R. Kolagunta, John Mendonca +2 more 2001-08-14