Issued Patents All Time
Showing 26–50 of 342 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11935921 | Dielectric structures for semiconductor devices | Kuan-Lun Cheng, Chih-Hao Wang | 2024-03-19 |
| 11901190 | Method of patterning | Chin-Yuan Tseng, Yu-Tien Shen, Wei-Liang Lin, Chih-Ming Lai, Shi Ning Ju +2 more | 2024-02-13 |
| 11894443 | Method of making gate structure of a semiconductor device | Ming Zhu, Hui-Wen Lin, Harry-Hak-Lay Chuang, Bao-Ru Young, Yuan-Sheng Huang +4 more | 2024-02-06 |
| 11894275 | FinFET device having oxide region between vertical fin structures | Ying-Keung Leung | 2024-02-06 |
| 11889674 | Structure and method for SRAM FinFET device having an oxide feature | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2024-01-30 |
| 11855087 | Semiconductor device and fabricating the same | Ting-Hung Hsu | 2023-12-26 |
| 11855082 | Integrated circuits with FinFET gate structures | Huan-Chieh Su, Zhi-Chang Lin, Chih-Hao Wang | 2023-12-26 |
| 11855084 | Integrated circuits with FinFET gate structures | Huan-Chieh Su, Zhi-Chang Lin, Chih-Hao Wang | 2023-12-26 |
| 11848326 | Integrated circuits with gate cut features | Zhi-Chang Lin, Wei-Hao Wu, Jia-Ni Yu, Chih-Hao Wang | 2023-12-19 |
| 11837506 | FinFET devices and methods of forming the same | Chih-Hao Wang, Jui-Chien Huang, Chun-Hsiung Lin, Pei-Hsun Wang | 2023-12-05 |
| 11824058 | Method of forming semiconductor device | Shi Ning Ju, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2023-11-21 |
| 11804489 | Semiconductor device and manufacturing method thereof | Chih-Hao Wang, Chih-Liang Chen, Shi Ning Ju | 2023-10-31 |
| 11764286 | Reducing parasitic capacitance for gate-all-around device by forming extra inner spacers | Chih-Hao Wang, Shi Ning Ju, Kuan-Lun Cheng | 2023-09-19 |
| 11742415 | Fin-like field effect transistor patterning methods for achieving fin width uniformity | Shi Ning Ju, Kuan-Lun Cheng, Chih-Hao Wang | 2023-08-29 |
| 11735650 | Structure and method for FinFET device with buried sige oxide | Carlos H. Diaz, Chih-Hao Wang, Zhiqiang Wu | 2023-08-22 |
| 11735649 | Method for forming fin field effect transistor (FinFET) with a liner layer | Kuan-Ting Pan, Shi Ning Ju, Chih-Hao Wang | 2023-08-22 |
| 11688809 | Semiconductor device structure | Kuan-Ting Pan, Kuan-Lun Cheng, Chih-Hao Wang | 2023-06-27 |
| 11676866 | Semiconductor arrangement and method of manufacture | Lung-Kun Chu, Mao-Lin Huang, Chung-Wei Hsu | 2023-06-13 |
| 11652160 | Fin-like field effect transistor patterning methods for achieving fin width uniformity | Shi Ning Ju, Kuan-Lun Cheng, Chih-Hao Wang | 2023-05-16 |
| 11652001 | FinFET channel on oxide structures and related methods | Ching-Wei Tsai, Ying-Keung Leung | 2023-05-16 |
| 11626509 | Semiconductor device and manufacturing method thereof | Shi Ning Ju, Kuan-Ting Pan, Kuan-Lun Cheng, Chih-Hao Wang | 2023-04-11 |
| 11621323 | Fill fins for semiconductor devices | Kuan-Lun Cheng, Chih-Hao Wang | 2023-04-04 |
| 11575027 | Dummy dielectric fin design for parasitic capacitance reduction | Chih-Hao Wang, Shi Ning Ju, Kuan-Lun Cheng | 2023-02-07 |
| 11563118 | Structure and method for SRAM FinFET device | Ka-Hing Fung, Zhiqiang Wu, Carlos H. Diaz | 2023-01-24 |
| 11563106 | Formation method of isolation feature of semiconductor device structure | Shi Ning Ju, Kuan-Ting Pan, Kuan-Lun Cheng, Chih-Hao Wang | 2023-01-24 |