Issued Patents All Time
Showing 426–450 of 458 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8048752 | Spacer shape engineering for void-free gap-filling process | Ming-Yuan Wu, Yi-Shien Mor, Chih-Tang Peng, Chiung-Han Yeh, Kong-Beng Thei +1 more | 2011-11-01 |
| 8039388 | Main spacer trim-back method for replacement gate process | Jin-Aun Ng, Yu-Ying Hsu, Chi-Ju Lee, Sin-Hua Wu, Bao-Ru Young | 2011-10-18 |
| 8039381 | Photoresist etch back method for gate last process | Chiung-Han Yeh, Chen-Pin Hsu, Ming-Yuan Wu, Kong-Beng Thei | 2011-10-18 |
| 8035165 | Integrating a first contact structure in a gate last process | Chiung-Han Yeh, Ming-Yuan Wu, Kong-Beng Thei, Mong-Song Liang | 2011-10-11 |
| 8017473 | Modifying work function in PMOS devices by counter-doping | Chun-Yi Lee, Ping-Wei Wang, Kong-Beng Thei | 2011-09-13 |
| 8008145 | High-K metal gate structure fabrication method including hard mask | Shun-Jang Liao, Sheng-Chen Chung, Kong-Beng Thei | 2011-08-30 |
| 8003467 | Method for making a semiconductor device having metal gate stacks | Jin-Aun Ng, Wen-Chih Yang, Chien-Liang Chen, Chung-Hau Fei, Maxi Chang +1 more | 2011-08-23 |
| 7998830 | Semiconductor device with both I/O and core components and method of fabricating same | Chung Long Cheng, Sheng-Chen Chung, Kong-Beng Thei, Mong-Song Liang | 2011-08-16 |
| 7985690 | Method for a gate last process | Kong-Beng Thei, Su-Chen Lai, Gary Shen | 2011-07-26 |
| 7981801 | Chemical mechanical polishing (CMP) method for gate last process | Kong-Beng Thei, Su-Chen Lai, Gary Shen | 2011-07-19 |
| 7977181 | Method for gate height control in a gate last process | Su-Chen Lai, Kong-Beng Thei | 2011-07-12 |
| 7977202 | Reducing device performance drift caused by large spacings between active regions | Kong-Beng Thei, Mong-Song Liang | 2011-07-12 |
| 7977754 | Poly resistor and poly eFuse design for replacement gate technology | Kong-Beng Thei | 2011-07-12 |
| 7955964 | Dishing-free gap-filling with multiple CMPs | Ming-Yuan Wu, Kong-Beng Thei, Chiun-Han Yeh, Mong-Song Liang | 2011-06-07 |
| 7939392 | Method for gate height control in a gate last process | Sheng-Chen Chung, Kong-Beng Thei | 2011-05-10 |
| 7939384 | Eliminating poly uni-direction line-end shortening using second cut | Kong-Beng Thei | 2011-05-10 |
| 7927943 | Method for tuning a work function of high-k metal gate devices | Chiung-Han Yeh, Sheng-Chen Chung, Kong-Beng Thei | 2011-04-19 |
| 7923321 | Method for gap filling in a gate last process | Su-Chen Lai, Kong-Beng Thei, Gary Shen | 2011-04-12 |
| 7919792 | Standard cell architecture and methods with variable design rules | Oscar M. K. Law, Manoj Joshi, Kong-Beng Thei | 2011-04-05 |
| 7915111 | Semiconductor device with high-K/dual metal gate | Wen-Chih Yang, Chien-Liang Chen, Chii-Horng Lee | 2011-03-29 |
| 7898037 | Contact scheme for MOSFETs | Kong-Beng Thei, Mong-Song Liang, Jung-Hui Kao, Sheng-Chen Chung, Chung Long Cheng +1 more | 2011-03-01 |
| 7868361 | Semiconductor device with both I/O and core components and method of fabricating same | Chung Long Cheng, Sheng-Chen Chung, Kong-Beng Thei, Mong-Song Liang | 2011-01-11 |
| 7868386 | Method and apparatus for semiconductor device with improved source/drain junctions | Kong-Beng Thei, Chung Long Cheng | 2011-01-11 |
| 7816686 | Forming silicides with reduced tailing on silicon germanium and silicon | Kuo-Hua Pan, Ken Liao, Augus Tai | 2010-10-19 |
| 7750416 | Modifying work function in PMOS devices by counter-doping | Chun-Yi Lee, Ping-Wei Wang, Kong-Beng Thei | 2010-07-06 |