Issued Patents All Time
Showing 901–925 of 937 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8067280 | High performance CMOS devices and methods for making same | Ta-Wei Wang, Chenming Hu | 2011-11-29 |
| 7978946 | Optical fibers with improved resistance to ingressing molecules | Imtiaz Majid, Abdel Soufiane, Kanxian Wei, Gary Drenzek | 2011-07-12 |
| 7919372 | Method for forming oxide on ONO structure | Hsin-Huei Chen, Chong-Jen Huang, Kuang-Wen Liu, Jia-Rong Chiou, Chong Chen | 2011-04-05 |
| 7829978 | Closed loop CESL high performance CMOS device | Shang-Chih Chen, Shih-Hsieng Huang | 2010-11-09 |
| 7768072 | Silicided metal gate for multi-threshold voltage configuration | Ching-Wei Tsai, Wei-Jung Lin, Huan-Tsung Huang, Carlos H. Diaz | 2010-08-03 |
| 7763945 | Strained spacer design for protecting high-K gate dielectric | Shang-Chih Chen | 2010-07-27 |
| 7727845 | Ultra shallow junction formation by solid phase diffusion | Yen-Ping Wang, Steve Ting, Yi-Chun Huang | 2010-06-01 |
| 7649233 | High performance transistor with a highly stressed channel | Ching-Wei Tsai, Ta-Wei Wang | 2010-01-19 |
| 7642607 | MOS devices with reduced recess on substrate surface | Ta-Wei Wang | 2010-01-05 |
| 7622345 | Method for forming fully silicided gate electrodes and unsilicided poly resistors | Steve Ting | 2009-11-24 |
| 7615426 | PMOS transistor with discontinuous CESL and method of fabrication | Yen-Ping Wang, Pang-Yen Tsai | 2009-11-10 |
| 7564108 | Nitrogen treatment to improve high-k gate dielectrics | Ta-Wei Wang, Shang-Chih Chen, Ching-Wei Tsai | 2009-07-21 |
| 7498641 | Partial replacement silicide gate | Yen-Ping Wang, Chenming Hu | 2009-03-03 |
| 7465972 | High performance CMOS device design | Shang-Chih Chen, Ching-Wei Tsai, Ta-Wei Wang, Pang-Yen Tsai | 2008-12-16 |
| 7381619 | Dual work-function metal gates | Yu-Shen Lai | 2008-06-03 |
| 7355235 | Semiconductor device and method for high-k gate dielectrics | Ching-Wei Tsai, Shang-Chih Chen | 2008-04-08 |
| 7354830 | Methods of forming semiconductor devices with high-k gate dielectric | Chun-Chieh Lin, Wen-Chin Lee, Chenming Hu, Shang-Chih Chen, Fu-Liaog Yang +1 more | 2008-04-08 |
| 7332407 | Method and apparatus for a semiconductor device with a high-k gate dielectric | Ching-Wei Tsai, Shang-Chih Chen | 2008-02-19 |
| 7323392 | High performance transistor with a highly stressed channel | Ching-Wei Tsai, Ta-Wei Wang | 2008-01-29 |
| 7320921 | Smart grading implant with diffusion retarding implant for making integrated circuit chips | Ta-Wei Wang | 2008-01-22 |
| 7285833 | Selective doping and thermal annealing method for forming a gate electrode pair with different work functions | Yen-Ping Wang | 2007-10-23 |
| 7279756 | Semiconductor device with high-k gate dielectric and quasi-metal gate, and method of forming thereof | Ching-Wei Tsai, Chenming Hu | 2007-10-09 |
| 7268362 | High performance transistors with SiGe strain | Ta-Wei Wang | 2007-09-11 |
| 7253481 | High performance MOS device with graded silicide | Ta-Wei Wang, Ching-Wei Tsai | 2007-08-07 |
| 7241558 | Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof | Chong-Jen Huang, Hsin-Huei Chen, Kuang-Wen Liu, Jia-Rong Chiou | 2007-07-10 |