Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10845711 | Lithography optics adjustment and monitoring | Omar Zurita, Abhishek Subramanian, Thomas Patrick Duffey | 2020-11-24 |
| 10371493 | Target assignment projectile | William P. Parker | 2019-08-06 |
| 10345714 | Lithography optics adjustment and monitoring | Omar Zurita, Abhishek Subramanian, Thomas Patrick Duffey | 2019-07-09 |
| 10267687 | Adjusting an amount of coherence of a light beam | Joshua Jon Thornes, Rostislav Rokitski, Thomas Patrick Duffey | 2019-04-23 |
| 10095118 | Lithography optics adjustment and monitoring | Khalid TAHBOUB, Donald James Haran, Rostislav Rokitski, Joshua Jon Thornes | 2018-10-09 |
| 10088286 | Target assignment projectile | William P. Parker | 2018-10-02 |
| 9945730 | Adjusting an amount of coherence of a light beam | Joshua Jon Thornes, Rostislav Rokitski, Thomas Patrick Duffey | 2018-04-17 |
| 9638501 | Target assignment projectile | William P. Parker | 2017-05-02 |
| 7617776 | Selective emitting flare nanosensors | William P. Parker | 2009-11-17 |
| 6913703 | Method of adjusting the thickness of an electrode in a plasma processing system | Eric J. Strang, Wayne Johnson | 2005-07-05 |
| 6676482 | Learning method and apparatus for predictive determination of endpoint during chemical mechanical planarization using sparse sampling | John A. Adams | 2004-01-13 |
| 6515493 | Method and apparatus for in-situ endpoint detection using electrical sensors | John A. Adams | 2003-02-04 |
| 6491569 | Method and apparatus for using optical reflection data to obtain a continuous predictive signal during CMP | John A. Adams | 2002-12-10 |
| 6361646 | Method and apparatus for endpoint detection for chemical mechanical polishing | John A. Adams, Robert A. Eaton | 2002-03-26 |
| 6106662 | Method and apparatus for endpoint detection for chemical mechanical polishing | John A. Adams, Robert A. Eaton, Christopher E. Barns, Charles Hannes | 2000-08-22 |
| 6056632 | Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head | Fred E. Mitchel, John A. Adams | 2000-05-02 |
| 5835226 | Method for determining optical constants prior to film processing to be used improve accuracy of post-processing thickness measurements | Michael Berman, Jayashree Kalpathy-Cramer, Eric Jacob Jan Kirchner | 1998-11-10 |
| 5633748 | Fiber optic Bragg grating demodulator and sensor incorporating same | Ignacio M. Perez | 1997-05-27 |
| 4666553 | Method for planarizing multilayer semiconductor devices | Martin Blumenfeld | 1987-05-19 |