JH

Jun Hatakeyama

SC Shin-Etsu Chemical Co.: 550 patents #1 of 2,176Top 1%
CL Central Glass Company, Limited: 29 patents #11 of 968Top 2%
Sumitomo Electric Industries: 25 patents #692 of 21,551Top 4%
CK Calsonic Kansei: 5 patents #47 of 675Top 7%
PA Panasonic: 3 patents #7,617 of 21,108Top 40%
Samsung: 3 patents #30,683 of 75,807Top 45%
TP Tigers Polymer: 2 patents #17 of 76Top 25%
MJ Marelli Cabin Comfort Japan: 2 patents #11 of 36Top 35%
Honda Motor Co.: 1 patents #12,035 of 21,052Top 60%
SC Shin-Etsu Handotai Co.: 1 patents #385 of 679Top 60%
MC Mastsushita Electric Industrial Co.: 1 patents #1 of 26Top 4%
📍 Joetsu, JP: #1 of 239 inventorsTop 1%
Overall (All Time): #297 of 4,157,543Top 1%
563
Patents All Time

Issued Patents All Time

Showing 526–550 of 563 patents

Patent #TitleCo-InventorsDate
6461789 Polymers, chemical amplification resist compositions and patterning process Jun Watanabe, Yuji Harada 2002-10-08
6461790 Polymers, chemical amplification resist compositions and patterning process Jun Watanabe, Yuji Harada, Mutsuo Nakashima, Masaru Sasago, Shinji Kishimura 2002-10-08
6455223 Resist compositions and patterning process Tomohiro Kobayashi, Osamu Watanabe, Takanobu Takeda, Toshinobu Ishihara, Jun Watanabe 2002-09-24
6448420 Acid-decomposable ester compound suitable for use in resist material Takeshi Kinsho, Tsunehiro Nishi, Takeru Watanabe, Koji Hasegawa, Mutsuo Nakashima 2002-09-10
6444396 Ester compounds, polymers, resist composition and patterning process Takeru Watanabe, Takeshi Kinsho, Tsunehiro Nishi, Mutsuo Nakashima, Koji Hasegawa 2002-09-03
6436606 Polymers, resist compositions and patterning process Jun Watanabe, Yuji Harada 2002-08-20
6420085 Resist compositions and patterning process Tsunehiro Nishi, Youichi Ohsawa 2002-07-16
6413695 Resist compositions and patterning process Tsunehiro Nishi, Takeshi Kinsho, Takeru Watanabe, Koji Hasegawa, Mutsuo Nakashima 2002-07-02
6414101 Dendritic polymers and making method Osamu Watanabe, Takanobu Takeda, Tomohiro Kobayashi, Toshinobu Ishihara, Jun Watanabe 2002-07-02
6403822 Ester compounds having alicyclic structure and method for preparing same Takeru Watanabe, Koji Hasegawa, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2002-06-11
6403823 Ester compounds having alicyclic structure and method for preparing same Koji Hasegawa, Takeru Watanabe, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2002-06-11
6399274 Resist composition and patterning process Takeshi Kinsho, Tsunehiro Nishi, Koji Hasegawa, Takeru Watanabe 2002-06-04
6369279 Styrene derivatives Mutsuo Nakashima, Jun Watanabe, Yuji Harada 2002-04-09
6333436 Styrene derivatives Matsuo Nakashima, Jun Watanabe, Yuji Harada 2001-12-25
6312867 Ester compounds, polymers, resist compositions and patterning process Takeshi Kinsho, Tsunehiro Nishi, Hideshi Kurihara, Koji Hasegawa, Takeru Watanabe +3 more 2001-11-06
6309796 High molecular weight silicone compounds resist compositions, and patterning method Mutsuo Nakashima, Ichiro Kaneko, Toshinobu Ishihara, Junji Tsuchiya, Shigehiro Nagura 2001-10-30
6280898 Lactone-containing compounds, polymers, resist compositions, and patterning method Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Osamu Watanabe 2001-08-28
6274286 Resist compositions Tsunehiro Nishi, Takeshi Nagata, Shigehiro Nagura 2001-08-14
6156481 Positive resist composition Takanobu Takeda, Osamu Watanabe, Jun Watanabe, Youichi Ohsawa, Toshinobu Ishihara 2000-12-05
6147249 Ester compounds, polymers, resist composition and patterning process Takeru Watanabe, Takeshi Kinsho, Tsunehiro Nishi, Mutsuo Nakashima, Koji Hasegawa 2000-11-14
6117621 Patterning method Shigehiro Nagura 2000-09-12
6048661 Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation Tsunehiro Nishi, Shigehiro Nagura, Toshinobu Ishihara 2000-04-11
6030746 Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution inhibitors, and chemically amplified positive resist compositions Takeshi Nagata, Satoshi Watanabe, Tsunehiro Nishi, Shigehiro Nagura, Toshinobu Ishihara 2000-02-29
5985512 Chemically amplified positive resist compositions Shigehiro Nagura, Toshinobu Ishihara 1999-11-16
5972560 High molecular weight silicone compound, chemically amplified positive resist composition and patterning method Ichiro Kaneko, Mutsuo Nakashima, Toshinobu Ishihara, Junji Tsuchiya, Shigehiro Nagura 1999-10-26