Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12322577 | Plasma baffle, substrate processing apparatus including the same, and substrate processing method using the same | Hakyoung Kim, Dowon Kim, Jisoo IM, Youngjin Noh, Chulwoo Park | 2025-06-03 |
| 12222362 | Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer | Yoonbum Nam, Namkyun Kim, Seungbo Shim, Donghyeon Na, Naohiko Okunishi +3 more | 2025-02-11 |
| 12210045 | Impedance measurement jig and method of controlling a substrate-processing apparatus using the jig | Byeongsang Kim, Dougyong Sung, Sungjin Kim, Yunhwan Kim, Inseok Seo +2 more | 2025-01-28 |
| 12020903 | Plasma etching method and semiconductor device fabrication method including the same | Yonghee Kim, Byunghun Han, Hyeongmo Kang, Donghyeon Na, Dougyong Sung +3 more | 2024-06-25 |
| 11545341 | Plasma etching method and semiconductor device fabrication method including the same | Yonghee Kim, Byunghun Han, Hyeongmo Kang, Donghyeon Na, Dougyong Sung +3 more | 2023-01-03 |
| 11398397 | Electrostatic chuck and plasma processing apparatus including the same | YongWoo Lee, Youngjin Noh, Myungsun Choi, Seungbo Shim, Jaehak Lee | 2022-07-26 |
| 11282679 | Plasma control apparatus and plasma processing system including the same | Donghyeon Na, Hyosin KIM, Seungbo Shim, Hadong JIN, Dougyong Sung | 2022-03-22 |