Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12222362 | Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer | Namkyun Kim, Seungbo Shim, Donghyeon Na, Naohiko Okunishi, Dongseok Han +3 more | 2025-02-11 |