Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7365025 | Methods of forming dual-damascene interconnect structures on semiconductor substrates using multiple planarization layers having different porosity characteristics | Kyoung-Woo Lee, Seung-Man Choi, Ki-Chul Park, Sun-Oo Kim | 2008-04-29 |
| 7317204 | Test structure of semiconductor device | Min-Chul Sun, Brian J. Greene, Manfred Eller, Wee Lang Tan, Sunfei Fang +1 more | 2008-01-08 |
| 7306996 | Methods of fabricating a semiconductor device having a metal gate pattern | Chang-Won Lee, Seong-Jun Heo, Sun-Pil Youn, Sung-Man Kim | 2007-12-11 |
| 7297584 | Methods of fabricating semiconductor devices having a dual stress liner | Jae-eon Park, Jun Jung Kim, Dae-Kwon Kang, Young Way Teh | 2007-11-20 |
| 7232756 | Nickel salicide process with reduced dopant deactivation | Kwan-Jong Roh, Min-Chul Sun, Min-Joo Kim, Sug-Woo Jung, Sun-Pil Youn | 2007-06-19 |
| 7109104 | Methods of fabricating a semiconductor device having a metal gate pattern | Chang-Won Lee, Seong-Jun Heo, Sun-Pil Youn, Sung-Man Kim | 2006-09-19 |
| 7098123 | Methods of forming a semiconductor device having a metal gate electrode and associated devices | Seong-Jun Heo, Sun-Pil Youn, Sung-Man Kim, Si-Young Choi, Gil-Heyun Choi +3 more | 2006-08-29 |
| 7084061 | Methods of fabricating a semiconductor device having MOS transistor with strained channel | Min-Chul Sun, Sug-Woo Jung, Sun-Pil Youn, Min-Joo Kim, Kwan-Jong Roh | 2006-08-01 |
| 7005367 | Method of fabricating a semiconductor device having a silicon oxide layer, a method of fabricating a semiconductor device having dual spacers, a method of forming a silicon oxide layer on a substrate, and a method of forming dual spacers on a conductive material layer | Chang-Won Lee, Seong-Jun Heo, Min-Chul Sun, Sun-Pil Youn | 2006-02-28 |
| 6960515 | Method of forming a metal gate | Mahn-Ho Cho, Chul-Joon Choi, Jun-Kyu Cho, Seong-Jun Heo | 2005-11-01 |
| 6936528 | Method of forming cobalt silicide film and method of manufacturing semiconductor device having cobalt silicide film | Kyeong-mo Koo, Hye Jeong Park | 2005-08-30 |
| 6864132 | Methods of fabricating integrated circuit gates by pretreating prior to oxidizing | Jun-Kyu Cho, Si-Young Choi, Sun-Pil Youn, Sung-Man Kim | 2005-03-08 |
| 6797559 | Method of fabricating semiconductor device having metal conducting layer | Chang-Won Lee, Si-Young Choi, Seong-Jun Heo, Sung-Man Kim, Min-Chul Sun +1 more | 2004-09-28 |
| 6764961 | Method of forming a metal gate electrode | Mahn-Ho Cho, Chul-Joon Choi, Seong-Jun Heo, Jun-Kyu Cho | 2004-07-20 |
| 6624496 | Method of forming T-shaped isolation layer, method of forming elevated salicide source/drain region using the same, and semiconductor device having T-shaped isolation layer | Dong-Ho Ahn, Chul-Sung Kim, Jae-Yoon Yoo, Sug-hun Hong, Chul-Joon Choi | 2003-09-23 |
| 6383877 | Method of forming T-shaped isolation layer, method of forming elevated salicide source/drain region using the same, and semiconductor device having T-shaped isolation layer | Dong-Ho Ahn, Chul-Sung Kim, Jae-Yoon Yoo, Sug-hun Hong, Chul-Joon Choi | 2002-05-07 |
| 6329276 | Method of forming self-aligned silicide in semiconductor device | Soo-geun Lee, Chul-Sung Kim, Tae-Wook Seo, Eung-Joon Lee, Joo-Hyuk Chung | 2001-12-11 |
| 6255181 | Method for fabricating MOS semiconductor device having salicide region and LDD structure | Oh-Sung Song | 2001-07-03 |
| 6218690 | Transistor having reverse self-aligned structure | Hyoung-sub Kim, Chul-Sung Kim, Jung-Woo Park | 2001-04-17 |