Issued Patents All Time
Showing 51–75 of 85 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10798672 | Inter-radio access technology positioning measurements in new radio systems | Jie Cui, Yang Tang | 2020-10-06 |
| 10781343 | Acid polishing composition and method of polishing a substrate having enhanced defect inhibition | David Mosley | 2020-09-22 |
| 10683439 | Polishing composition and method of polishing a substrate having enhanced defect inhibition | — | 2020-06-16 |
| 10584265 | Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them | Naresh Kumar Penta, David Mosley, Matthew Van Hanehem, Kwadwo E. Tettey | 2020-03-10 |
| 10569384 | Chemical mechanical polishing pad and polishing method | Matthew R. Gadinski, Mohammad T. Islam, George C. Jacob | 2020-02-25 |
| 10508221 | Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them | David Mosley, Naresh Kumar Penta | 2019-12-17 |
| 10464188 | Chemical mechanical polishing pad and polishing method | Matthew R. Gadinski, Mohammad T. Islam, George C. Jacob | 2019-11-05 |
| 10119048 | Low-abrasive CMP slurry compositions with tunable selectivity | David Mosley, Naresh Kumar Penta | 2018-11-06 |
| 9803108 | Aqueous compositions of stabilized aminosilane group containing silica particles | David Mosley, David L. Thorsen | 2017-10-31 |
| 9783702 | Aqueous compositions of low abrasive silica particles | David Mosley, Matthew Van Hanehem | 2017-10-10 |
| 9718745 | Premixer, radially fixed bed reactor, reaction system for oxidative dehydrogenation | Weimin Yang, Wenjie Liu, Yunqun Huang, Depan Shi | 2017-08-01 |
| 9534148 | Method of polishing semiconductor substrate | David Mosley | 2017-01-03 |
| 9484212 | Chemical mechanical polishing method | Bainian Qian, Marty W. DeGroot, George C. Jacob | 2016-11-01 |
| 9393542 | Multi-stage plasma reactor system with hollow cathodes for cracking carbonaceous material | Xuan Li, Binhang Yan, Changning Wu, Yi-Wen Cheng | 2016-07-19 |
| 9293339 | Method of polishing semiconductor substrate | David Mosley | 2016-03-22 |
| 9275899 | Chemical mechanical polishing composition and method for polishing tungsten | Raymond Lavoie | 2016-03-01 |
| 9012327 | Low defect chemical mechanical polishing composition | — | 2015-04-21 |
| 8865013 | Method for chemical mechanical polishing tungsten | Jerry Lee, Raymond Lavoie, Guangyun Zhang | 2014-10-21 |
| 8790160 | Chemical mechanical polishing composition and method for polishing phase change alloys | Jaeseok Lee, Kancharla-Arun Kumar Reddy, Guangyun Zhang | 2014-07-29 |
| 8568610 | Stabilized, concentratable chemical mechanical polishing composition and method of polishing a substrate | Zhendong Liu, Kancharla-Arun Kumar Reddy, Guangyun Zhang | 2013-10-29 |
| 8513126 | Slurry composition having tunable dielectric polishing selectivity and method of polishing a substrate | Zhendong Liu, Kancharla-Arun Kumar Reddy, Guangyun Zhang | 2013-08-20 |
| 8496843 | Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride | Zhendong Liu, Kancharla-Arun Kumar Reddy, Guangyun Zhang | 2013-07-30 |
| 8492277 | Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride | Zhendong Liu, Kancharla-Arun Kumar Reddy, Guangyun Zhang | 2013-07-23 |
| 8491808 | Method of polishing a substrate comprising polysilicon, silicon oxide and silicon nitride | Zhendong Liu, Kancharla-Arun Kumar Reddy, Guangyun Zhang | 2013-07-23 |
| 8444728 | Stabilized chemical mechanical polishing composition and method of polishing a substrate | Zhendong Liu, Kancharla-Arun Kumar Reddy, Guangyun Zhang | 2013-05-21 |