Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Self-aligned interconnects formed using substractive techniques

Self-aligned interconnects formed using substractive techniques

US Patent 9761489 · Granted Sep 12, 2017

Estimated economic value: $20,589,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System architecture of manufacturing of semiconductor wafers2025
Method and apparatus of low temperature plasma enhanced chemical vapor depositio2025
Monolithic complementary field-effect transistors having carbon-doped release la2025
Optical device improvement2025
Metal oxide resist patterning with electrical field guided post-exposure bake2025
Contact over active gate structure2025
Spin-orbit torque MRAM structure and manufacture thereof2025
Photoresist patterning process2024
Device enclosure temperature control2024
Fluorine-free tungsten ALD for dielectric selectivity improvement2024
Method of dielectric material fill and treatment2024
Method of dielectric material fill and treatment2024