Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus of low temperature plasma enhanced chemical vapor deposition of graphene

Method and apparatus of low temperature plasma enhanced chemical vapor deposition of graphene

US Patent 12300497 · Granted May 13, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma chamber with gas cross-flow, microwave resonators and a rotatable pedesta2025
Directional selective junction clean with field polymer protections2025
Nanocrystalline diamond with amorphous interfacial layer2025
Nanocrystalline diamond with amorphous interfacial layer2025
Capacitive sensors and capacitive sensing locations for plasma chamber condition2025
Low temperature selective etching of silicon nitride using microwave plasma2025
Low temperature selective etching of silicon nitride using microwave plasma2025
Low temperature selective etching of silicon nitride using microwave plasma2025
Smart camera substrate2025
Reaction cell for species sensing2025
Methods and apparatus for processing a substrate2025
Symmetric and irregular shaped plasmas using modular microwave sources2025