Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Patterning process using a boron phosphorus silicon glass film

Patterning process using a boron phosphorus silicon glass film

US Patent 9580623 · Granted Feb 28, 2017

Estimated economic value: $2,397,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Material for forming adhesive film, method for forming adhesive film using the s2025
Material for forming organic film, patterning process, compound, and polymer2025
Material for forming organic film, patterning process, and polymer2025
Material for forming organic film, patterning process, and polymer2025
Material for forming adhesive film, patterning process, and method for forming a2025
Thermosetting iodine- and silicon-containing material, composition containing th2025
Composition for forming silicon-containing resist underlayer film, patterning pr2025
Composition for forming silicon-containing resist underlayer film and patterning2024
Coating-type composition for forming organic film, patterning process, polymer, 2024
Composition for forming silicon-containing resist underlayer film and patterning2024
Reducing line edge roughness and mitigating defects by wafer freezing2024
Resist material and patterning process2024