Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process

Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process

US Patent 12332565 · Granted Jun 17, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Material for forming adhesive film, method for forming adhesive film using the s2025
Material for forming adhesive film, method for forming adhesive film using the s2025
Material for forming organic film, patterning process, and polymer2025
Material for forming adhesive film, patterning process, and method for forming a2025
Material for forming adhesive film, patterning process, and method for forming a2025
Composition for forming silicon-containing resist underlayer film, patterning pr2025
Bearing device for vehicle wheel2025
Material for forming organic film, method for forming organic film, patterning p2025
Composition for forming silicon-containing resist underlayer film and patterning2024
Composition for forming silicon-containing resist underlayer film and patterning2024
Composition for forming silicon-containing resist underlayer film and patterning2024
Resist underlayer film material, patterning process, and method for forming resi2024