Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

US Patent 8585224 · Granted Nov 19, 2013

Estimated economic value: $8,486,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Lithographic system provided with a deflection apparatus for changing a trajecto2025
Method for maintaining a projection exposure apparatus, service module and arran2025
Projection exposure apparatus having a device for determining the concentration 2025
Method for operating an EUV lithography apparatus, and EUV lithography apparatus2025
Lithographic apparatus and electrostatic clamp designs2024
Method for avoiding a degradation of an optical element, projection system, illu2024
Lithographic apparatus2024
Prolonging optical element lifetime in an EUV lithography system2023
Audio amplifier2023
Linear motor stator arrangement with external convective forced cooling2023
Prolonging optical element lifetime in an EUV lithography system2022
Lithographic apparatus2022