Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for operating an EUV lithography apparatus, and EUV lithography apparatus

Method for operating an EUV lithography apparatus, and EUV lithography apparatus

US Patent 12287588 · Granted Apr 29, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for maintaining a projection exposure apparatus, service module and arran2025
Projection exposure apparatus having a device for determining the concentration 2025
Projection exposure apparatus having a device for determining the concentration 2025
Method for avoiding a degradation of an optical element, projection system, illu2024
Method for operating an optical apparatus, and optical apparatus2022
Method for removing a contamination layer by an atomic layer etching process2021
Method for removing a contamination layer by an atomic layer etching process2021
Optical arrangement for EUV radiation with a shield for protection against the e2021
Optical assembly with a protective element and optical arrangement therewith2021
Projection exposure system for semiconductor lithography, comprising elements fo2020
Projection exposure system for semiconductor lithography, comprising elements fo2020
Optical element and optical system for EUV lithography, and method for treating 2020