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Home › Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation

Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation

US Patent 7431859 · Granted Oct 7, 2008

Estimated economic value: $9,830,000 ⓘ

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