Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of cleaning a semiconductor device processing chamber after a copper etch process

Method of cleaning a semiconductor device processing chamber after a copper etch process

US Patent 6352081 · Granted Mar 5, 2002

Estimated economic value: $46,608,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of cleaning chamber components with metal etch residues2025
Hybrid dynamic vision sensor and CMOS device for motion compensation2025
Method for conditioning semiconductor processing chamber components2024
Conditioning chamber component2024
Method for conditioning a ceramic coating2022
Coated article and semiconductor chamber apparatus formed from yttrium oxide and2022
Method to selectively pattern a surface for plasma resistant coat applications2021
Conditioning chamber component2021
Method of forming a bulk article and semiconductor chamber apparatus from yttriu2020
Coated article and semiconductor chamber apparatus formed from yttrium oxide and2020
Method of forming a coated article and semiconductor chamber apparatus from yttr2020
Thin film semiconductor material produced through reactive sputtering of zinc ta2020