Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method to selectively pattern a surface for plasma resistant coat applications

Method to selectively pattern a surface for plasma resistant coat applications

US Patent 11124659 · Granted Sep 21, 2021

Estimated economic value: $178,243,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of cleaning chamber components with metal etch residues2025
Method and apparatus for measuring particles2025
Method and apparatus for measuring particles2025
Method and apparatus for measuring particles2025
Single crystal metal oxide plasma chamber component2025
Laminated aerosol deposition coating for aluminum components for plasma processi2025
Method for conditioning semiconductor processing chamber components2024
Method for conditioning semiconductor processing chamber components2024
Vacuum pump protection against deposition byproduct buildup2024
Chamber component cleanliness measurement system2024
Chamber component cleanliness measurement system2024
Chamber component cleanliness measurement system2024