Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming a coated article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide

Method of forming a coated article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide

US Patent 10840113 · Granted Nov 17, 2020

Estimated economic value: $41,112,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Halogen resistant coatings and methods of making and using thereof2025
Protective metal oxy-fluoride coatings2025
Atomic layer deposition coatings for high temperature ceramic components2025
Plasma chamber with multiphase rotating independent gas cross-flow with reduced 2025
Method for managing storage controllers, electronic device, and computer readabl2025
Method for dynamically configuring data switch to enable rate adaption between c2025
Method for packaging driver kernel module, electronic device and storage medium2025
Hafnium aluminum oxide coatings deposited by atomic layer deposition2025
Electronic device, server testing system and method with environment detection h2025
Substrate support gap pumping to prevent glow discharge and light-up2025
Hard disk pluggable method and system, and server2025
Fluorine-containing elastomer composition and method for making cured fluorine-c2025