Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method

Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method

US Patent 11092900 · Granted Aug 17, 2021

Estimated economic value: $73,747,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for controlling a manufacturing process and associated apparatuses2025
Method and apparatus for design of a metrology target2025
Method of controlling a patterning process, device manufacturing method2025
Method and apparatus to determine a patterning process parameter2025
Method and apparatus to determine a patterning process parameter2025
Method and apparatus to determine a patterning process parameter2025
Metrology method, target and substrate2025
Metrology method, target and substrate2025
Method for filtering an image and associated metrology apparatus2025
Method for applying a deposition model in a semiconductor manufacturing process2025
Method and apparatus to determine a patterning process parameter2025
Method and apparatus to determine a patterning process parameter2025