| 11925912 |
Fluid processing systems including a plurality of material tanks, at least one mixing tank, at least one holding tank, and recirculation loops |
Shih-Pin Chou, Wen-Hung Chang, Tamas Varga, Abhudaya Mishra |
2024-03-12 |
|
| 10364373 |
Elevated temperature CMP compositions and methods for use thereof |
— |
2019-07-30 |
|
| 10167415 |
Reduction in large particle counts in polishing slurries |
James McDonough, Laura John |
2019-01-01 |
|
| 10159949 |
Advanced fluid processing methods and systems |
Shih-Pin Chou, Wen-Hung Chang, Tamas Varga, Abhudaya Mishra |
2018-12-25 |
|
| 9914852 |
Reduction in large particle counts in polishing slurries |
James McDonough, Laura John |
2018-03-13 |
|
| 9735031 |
Polishing compositions and methods for polishing cobalt films |
Luling Wang, Abhudaya Mishra, Richard Wen |
2017-08-15 |
|
| 9735030 |
Polishing compositions and methods for polishing cobalt films |
Luling Wang, Abhudaya Mishra, Richard Wen |
2017-08-15 |
|
| 9556371 |
Homogeneous blending |
Saeed H. Mohseni, Elizabeth K. Gramm |
2017-01-31 |
|
| 9190286 |
Composition for advanced node front-and-back-end of line chemical mechanical polishing |
Bin Hu, Abhiskek Singh, Gert Moyaerts, Richard Wen |
2015-11-17 |
|
| 8974677 |
Fluid processing |
Saeed H. Mohseni |
2015-03-10 |
$3,161,000 |
| 8961815 |
Composition for advanced node front-and back-end of line chemical mechanical polishing |
Bin Hu, Abhiskek Singh, Gert Moyaerts, Richard Wen |
2015-02-24 |
$3,156,000 |
| 8779011 |
Ultrapure colloidal silica for use in chemical mechanical polishing applications |
Yuhu Wang, Ken A. Delbridge, Gert Moyaerts, Saeed H. Mohseni, Nichole R. Koontz +2 more |
2014-07-15 |
|
| 8771540 |
Highly dilutable polishing concentrates and slurries |
Hyungjun Kim, Richard Wen, Bin Hu, Minae Tanaka |
2014-07-08 |
|
| 8742130 |
Hydrate forms of 1,2,4-triazole, processes for manufacture thereof, and compositions thereof |
Luling Wang |
2014-06-03 |
|
| 8404143 |
Highly dilutable polishing concentrates and slurries |
Hyungjun Kim, Richard Wen, Bin Hu, Minae Tanaka |
2013-03-26 |
|
| 8303806 |
Fluid processing |
Saeed H. Mohseni |
2012-11-06 |
$335,000 |
| 8211193 |
Ultrapure colloidal silica for use in chemical mechanical polishing applications |
Yuhu Wang, Ken A. Delbridge, Gert Moyaerts, Saeed H. Mohseni, Nichole R. Koontz +2 more |
2012-07-03 |
|
| 8192644 |
Highly dilutable polishing concentrates and slurries |
Hyungjun Kim, Richard Wen, Bin Hu, Minae Tanaka |
2012-06-05 |
|
| 6776696 |
Continuous chemical mechanical polishing process for polishing multiple conductive and non-conductive layers on semiconductor wafers |
Richard Jenkins |
2004-08-17 |
$2,111,000 |
| 6749488 |
Chemical mechanical polishing slurry composition for polishing conductive and non-conductive layers on semiconductor wafers |
Anthony M. Pasqualoni, Larry LaFollette, Richard Jenkins |
2004-06-15 |
$2,031,000 |
| 6468913 |
Ready-to-use stable chemical-mechanical polishing slurries |
Anthony M. Pasqualoni |
2002-10-22 |
|
| 6447563 |
Chemical mechanical polishing slurry system having an activator solution |
— |
2002-09-10 |
|
| 6262477 |
Ball grid array electronic package |
Paul R. Hoffman, Jeffrey S. Braden |
2001-07-17 |
|
| 6158351 |
Ferromagnetic bullet |
Brian Mravic, Henry J. Halverson |
2000-12-12 |
$10,342,000 |
| 6083840 |
Slurry compositions and method for the chemical-mechanical polishing of copper and copper alloys |
Brian Mravic, Anthony M. Pasqualoni |
2000-07-04 |
|