Issued Patents All Time
Showing 25 most recent of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11925912 | Fluid processing systems including a plurality of material tanks, at least one mixing tank, at least one holding tank, and recirculation loops | Shih-Pin Chou, Wen-Hung Chang, Tamas Varga, Abhudaya Mishra | 2024-03-12 |
| 10364373 | Elevated temperature CMP compositions and methods for use thereof | — | 2019-07-30 |
| 10167415 | Reduction in large particle counts in polishing slurries | James McDonough, Laura John | 2019-01-01 |
| 10159949 | Advanced fluid processing methods and systems | Shih-Pin Chou, Wen-Hung Chang, Tamas Varga, Abhudaya Mishra | 2018-12-25 |
| 9914852 | Reduction in large particle counts in polishing slurries | James McDonough, Laura John | 2018-03-13 |
| 9735031 | Polishing compositions and methods for polishing cobalt films | Luling Wang, Abhudaya Mishra, Richard Wen | 2017-08-15 |
| 9735030 | Polishing compositions and methods for polishing cobalt films | Luling Wang, Abhudaya Mishra, Richard Wen | 2017-08-15 |
| 9556371 | Homogeneous blending | Saeed H. Mohseni, Elizabeth K. Gramm | 2017-01-31 |
| 9190286 | Composition for advanced node front-and-back-end of line chemical mechanical polishing | Bin Hu, Abhiskek Singh, Gert Moyaerts, Richard Wen | 2015-11-17 |
| 8974677 | Fluid processing | Saeed H. Mohseni | 2015-03-10 |
| 8961815 | Composition for advanced node front-and back-end of line chemical mechanical polishing | Bin Hu, Abhiskek Singh, Gert Moyaerts, Richard Wen | 2015-02-24 |
| 8779011 | Ultrapure colloidal silica for use in chemical mechanical polishing applications | Yuhu Wang, Ken A. Delbridge, Gert Moyaerts, Saeed H. Mohseni, Nichole R. Koontz +2 more | 2014-07-15 |
| 8771540 | Highly dilutable polishing concentrates and slurries | Hyungjun Kim, Richard Wen, Bin Hu, Minae Tanaka | 2014-07-08 |
| 8742130 | Hydrate forms of 1,2,4-triazole, processes for manufacture thereof, and compositions thereof | Luling Wang | 2014-06-03 |
| 8404143 | Highly dilutable polishing concentrates and slurries | Hyungjun Kim, Richard Wen, Bin Hu, Minae Tanaka | 2013-03-26 |
| 8303806 | Fluid processing | Saeed H. Mohseni | 2012-11-06 |
| 8211193 | Ultrapure colloidal silica for use in chemical mechanical polishing applications | Yuhu Wang, Ken A. Delbridge, Gert Moyaerts, Saeed H. Mohseni, Nichole R. Koontz +2 more | 2012-07-03 |
| 8192644 | Highly dilutable polishing concentrates and slurries | Hyungjun Kim, Richard Wen, Bin Hu, Minae Tanaka | 2012-06-05 |
| 6776696 | Continuous chemical mechanical polishing process for polishing multiple conductive and non-conductive layers on semiconductor wafers | Richard Jenkins | 2004-08-17 |
| 6749488 | Chemical mechanical polishing slurry composition for polishing conductive and non-conductive layers on semiconductor wafers | Anthony M. Pasqualoni, Larry LaFollette, Richard Jenkins | 2004-06-15 |
| 6468913 | Ready-to-use stable chemical-mechanical polishing slurries | Anthony M. Pasqualoni | 2002-10-22 |
| 6447563 | Chemical mechanical polishing slurry system having an activator solution | — | 2002-09-10 |
| 6262477 | Ball grid array electronic package | Paul R. Hoffman, Jeffrey S. Braden | 2001-07-17 |
| 6158351 | Ferromagnetic bullet | Brian Mravic, Henry J. Halverson | 2000-12-12 |
| 6083840 | Slurry compositions and method for the chemical-mechanical polishing of copper and copper alloys | Brian Mravic, Anthony M. Pasqualoni | 2000-07-04 |