Issued Patents All Time
Showing 26–50 of 86 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9726987 | Positioning system using surface pattern recognition and interpolation | Paul Derek Coon, Jonathan K. Wells, Matthew Rosa | 2017-08-08 |
| 9529353 | Methods for limiting counter-mass trim-motor force and stage assemblies incorporating same | Pai-Hsueh Yang, Scott Coakley | 2016-12-27 |
| 9500960 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2016-11-22 |
| 9465305 | Method for determining a commutation offset and for determining a compensation map for a stage | Pai-Hsueh Yang, Scott Coakley, Kazuhiro Hirano, Bausan Yuan, Shiang-Lung Koo | 2016-10-11 |
| 9329493 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2016-05-03 |
| 9081298 | Apparatus for maintaining immersion fluid in the gap under the projection lens during wafer exchange using a co-planar member in an immersion lithography machine | — | 2015-07-14 |
| 9013134 | Method for determing a commutation offset and for determining a compensation map for a stage | Pai-Hsueh Yang, Scott Coakley, Kazuhiro Hirano, Bausan Yuan, Shiang-Lung Koo | 2015-04-21 |
| 8879047 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens using a pad member or second stage during wafer exchange in an immersion lithography machine | — | 2014-11-04 |
| 8853988 | Control systems and methods for compensating for effects of a stage motor | Scott Coakley, Douglas C. Watson, Pai-Hsueh Yang | 2014-10-07 |
| 8848168 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2014-09-30 |
| 8848166 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2014-09-30 |
| 8705222 | Compensating temperature effects in magnetic actuators | Scott Coakley | 2014-04-22 |
| 8705170 | High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations | David M. Williamson, Douglas C. Watson | 2014-04-22 |
| 8634057 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2014-01-21 |
| 8610875 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2013-12-17 |
| 8582080 | Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage | Wen-Hou Ma, Toshio Ueta, Pai-Hsueh Yang, Ting-Chien Teng, Bausan Yuan | 2013-11-12 |
| 8514367 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2013-08-20 |
| 8492934 | Coil variations for an oval coil planar motor | — | 2013-07-23 |
| 8488100 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2013-07-16 |
| 8432072 | Three axis linear actuator | Scott Coakley | 2013-04-30 |
| 8351019 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2013-01-08 |
| 8269944 | Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine | — | 2012-09-18 |
| 8212435 | High efficiency voice coil motor | Jean-Marc Gery | 2012-07-03 |
| 8140288 | On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage | Pai-Hsueh Yang, Bausan Yuan, Kazuo Masaki, Kazuhiro Hirano, Xiao-Feng Yang +1 more | 2012-03-20 |
| 8035795 | Apparatus and method for maintaining immersion fluid in the gap under the protection lens during wafer exchange in an immersion lithography machine | — | 2011-10-11 |