Issued Patents All Time
Showing 1–25 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6221323 | Method for producing super clean air | Masashi Mizuno, Masuo Tada, Norio Yamazaki | 2001-04-24 |
| 6207296 | Inorganic filler, epoxy resin composition, and semiconductor device | Noriaki Higuchi, Toshio Shiobara, Eiichi Asano, Kazutoshi Tomiyoshi | 2001-03-27 |
| 5940688 | Epoxy resin composition and semiconductor device encapsulated therewith | Noriaki Higuchi, Toshio Shiobara, Eiichi Asano, Kazutoshi Tomiyoshi | 1999-08-17 |
| 5935314 | Inorganic filler, epoxy resin composition, and semiconductor device | Noriaki Higuchi, Toshio Shiobara, Eiichi Asano, Kazutoshi Tomiyoshi | 1999-08-10 |
| 5827339 | Apparatus for generating chemical-free dry air | Hitoshi Nagafune, Hakushi Shibuya, Koji Ezaki | 1998-10-27 |
| 5752985 | Clean room having an air conditioning system | Hitoshi Nagafune, Hakushi Shibuya, Koji Ezaki | 1998-05-19 |
| 5554295 | Method for producing pure water | Cozy Ban, Motonori Yanagi, Toshiki Manabe, Hiroshi Yanome, Kazuhiko Kawada | 1996-09-10 |
| 5470461 | Apparatus for producing pure water | Cozy Ban, Motonori Yanagi, Toshiki Manabe, Hiroshi Yanome, Kazuhiko Kawada | 1995-11-28 |
| 5380471 | Aeration apparatus for producing ultrapure water | Cozy Ban, Motonori Yanagi, Toshiki Manabe, Hiroshi Yanome | 1995-01-10 |
| 5344615 | Wet-process apparatus | Motonori Yanagi, Cozy Ban | 1994-09-06 |
| 5336356 | Apparatus for treating the surface of a semiconductor substrate | Cozy Ban, Toshiaki Ohmori | 1994-08-09 |
| 5283989 | Apparatus for polishing an article with frozen particles | Akiko Hisasue, Itaru Kanno | 1994-02-08 |
| 5259972 | Apparatus and method for purifying water | Hitoshi Miyamaru, Motonori Yanagi | 1993-11-09 |
| 5246586 | Apparatus and method for producing ultrapure water and method of controlling the apparatus | Cozy Ban | 1993-09-21 |
| 5216890 | Device for and method of producing hyperfine frozen particles | Cozy Ban, Itaru Kanno | 1993-06-08 |
| 5186907 | Apparatus for treating organic waste gas | Motonori Yanagi, Masaharu Hama, Miki Tsukaguchi | 1993-02-16 |
| 5147466 | Method of cleaning a surface by blasting the fine frozen particles against the surface | Toshiaki Ohmori, Itaru Kanno | 1992-09-15 |
| 5129198 | Cleaning device for semiconductor wafers | Itaru Kanno, Nobuyoshi Hattori, Masuo Tada | 1992-07-14 |
| 5081068 | Method of treating surface of substrate with ice particles and hydrogen peroxide | Shinji Endo, Toshiaki Ohmori, Keisuke Namba | 1992-01-14 |
| 5074083 | Cleaning device using fine frozen particles | Itaru Kanno, Toshiaki Ohmori | 1991-12-24 |
| 5053064 | Air conditioning apparatus for a clean room | Masaharu Hama | 1991-10-01 |
| 5048331 | Continuous rainwater monitoring system | Nobuyoshi Hattori | 1991-09-17 |
| 5035750 | Processing method for semiconductor wafers | Masuo Tada, Takeki Hata, Toshiaki Ohmori | 1991-07-30 |
| 5025597 | Processing apparatus for semiconductor wafers | Masuo Tada, Takeki Hata, Toshiaki Ohmori | 1991-06-25 |
| 4986216 | Semiconductor manufacturing apparatus | Toshiaki Ohmori | 1991-01-22 |