EF

Eugene A. Fitzgerald

MIT: 53 patents #26 of 9,367Top 1%
AS Amberwave Systems: 41 patents #2 of 20Top 10%
TSMC: 24 patents #1,420 of 12,232Top 15%
NU Nanyang Technological University: 10 patents #9 of 1,285Top 1%
AT AT&T: 5 patents #3,608 of 18,772Top 20%
NS National University Of Singapore: 4 patents #72 of 1,623Top 5%
CF Cornell Research Foundation: 2 patents #418 of 1,638Top 30%
DL Draper Laboratory: 1 patents #495 of 921Top 55%
📍 Windham, NH: #1 of 335 inventorsTop 1%
🗺 New Hampshire: #22 of 12,181 inventorsTop 1%
Overall (All Time): #8,528 of 4,157,543Top 1%
129
Patents All Time

Issued Patents All Time

Showing 76–100 of 129 patents

Patent #TitleCo-InventorsDate
7081410 Controlling threading dislocation densities in Ge on Si using graded GeSi layers and planarization 2006-07-25
7074623 Methods of forming strained-semiconductor-on-insulator finFET device structures Anthony J. Lochtefeld, Thomas A. Langdo, Richard Hammond, Matthew T. Currie, Glyn Braithwaite 2006-07-11
7060632 Methods for fabricating strained layers on semiconductor substrates Matthew T. Currie 2006-06-13
7041170 Method of producing high quality relaxed silicon germanium layers Richard Westhoff, Matthew T. Currie, Christopher Vineis, Thomas A. Langdo 2006-05-09
7005668 Method for improving hole mobility enhancement in strained silicon p-type MOSFETS Minjoo L. Lee 2006-02-28
6995430 Strained-semiconductor-on-insulator device structures Thomas A. Langdo, Matthew T. Currie, Richard Hammond, Anthony J. Lochtefeld 2006-02-07
6987286 Yellow-green epitaxial transparent substrate-LEDs and lasers based on a strained-InGaP quantum well grown on an indirect bandgap substrate Lisa McGill 2006-01-17
6974735 Dual layer Semiconductor Devices 2005-12-13
6969875 Buried channel strained silicon FET using a supply layer created through ion implantation 2005-11-29
6940089 Semiconductor device structure Zhiyuan Cheng, Dimitri Antoniadis 2005-09-06
6927147 Coplanar integration of lattice-mismatched semiconductor with silicon via wafer bonding virtual substrates Arthuer J. Pitera 2005-08-09
6921914 Process for producing semiconductor article using graded epitaxial growth Zhi-Yuan Cheng, Dimitri Antoniadis, Judy L. Hoyt 2005-07-26
6916727 Enhancement of P-type metal-oxide-semiconductor field effect transistors Christopher Leitz, Minjoo L. Lee 2005-07-12
6900103 Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits 2005-05-31
6881632 Method of fabricating CMOS inverter and integrated circuits utilizing strained surface channel MOSFETS Nicole Gerrish 2005-04-19
6876010 Controlling threading dislocation densities in Ge on Si using graded GeSi layers and planarization 2005-04-05
6864115 Low threading dislocation density relaxed mismatched epilayers without high temperature growth 2005-03-08
6846715 Gate technology for strained surface channel and strained buried channel MOSFET devices Richard Hammond, Matthew T. Currie 2005-01-25
6838728 Buried-channel devices and substrates for fabrication of semiconductor-based devices Anthony J. Lochtefeld 2005-01-04
6831292 Semiconductor structures employing strained material layers with defined impurity gradients and methods for fabricating same Matthew T. Currie, Anthony J. Lochtefeld, Richard Hammond 2004-12-14
6830976 Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits 2004-12-14
6805744 Method of producing device quality (Al)InGaP alloys on lattice-mismatched substrates Andrew Y. Kim 2004-10-19
6750130 Heterointegration of materials using deposition and bonding 2004-06-15
6737670 Semiconductor substrate structure Zhi-Yuan Cheng, Dimitri Antoniadis, Judy L. Hoyt 2004-05-18
6730551 Formation of planar strained layers Minjoo L. Lee, Christopher Leitz 2004-05-04