EF

Eugene A. Fitzgerald

MIT: 53 patents #26 of 9,367Top 1%
AS Amberwave Systems: 41 patents #2 of 20Top 10%
TSMC: 24 patents #1,420 of 12,232Top 15%
NU Nanyang Technological University: 10 patents #9 of 1,285Top 1%
AT AT&T: 5 patents #3,608 of 18,772Top 20%
NS National University Of Singapore: 4 patents #72 of 1,623Top 5%
CF Cornell Research Foundation: 2 patents #418 of 1,638Top 30%
DL Draper Laboratory: 1 patents #495 of 921Top 55%
📍 Windham, NH: #1 of 335 inventorsTop 1%
🗺 New Hampshire: #22 of 12,181 inventorsTop 1%
Overall (All Time): #8,528 of 4,157,543Top 1%
129
Patents All Time

Issued Patents All Time

Showing 101–125 of 129 patents

Patent #TitleCo-InventorsDate
6713326 Process for producing semiconductor article using graded epitaxial growth Zhi-Yuan Cheng, Dimitri Antoniadis, Judy L. Hoyt 2004-03-30
6703144 Heterointegration of materials using deposition and bonding 2004-03-09
6689211 Etch stop layer system Kenneth Chai-en Wu, Jeffrey T. Borenstein, Gianna Taraschi 2004-02-10
6677192 Method of fabricating a relaxed silicon germanium platform having planarizing for high speed CMOS electronics and high speed analog circuits 2004-01-13
6649480 Method of fabricating CMOS inverter and integrated circuits utilizing strained silicon surface channel MOSFETs Nicole Gerrish 2003-11-18
6646322 Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits 2003-11-11
6602613 Heterointegration of materials using deposition and bonding 2003-08-05
6594293 Relaxed InxGa1-xAs layers integrated with Si Mayank Bulsara 2003-07-15
6593191 Buried channel strained silicon FET using a supply layer created through ion implantation 2003-07-15
6589335 Relaxed InxGa1-xAs layers integrated with Si Mayank Bulsara 2003-07-08
6583015 Gate technology for strained surface channel and strained buried channel MOSFET devices Richard Hammond, Matthew T. Currie 2003-06-24
6573126 Process for producing semiconductor article using graded epitaxial growth Zhi-Yuan Cheng, Dimitri Antoniadis, Judy L. Hoyt 2003-06-03
6555839 Buried channel strained silicon FET using a supply layer created through ion implantation 2003-04-29
6521041 Etch stop layer system Kenneth Chai-en Wu, Jeffrey T. Borenstein 2003-02-18
6518644 Low threading dislocation density relaxed mismatched epilayers without high temperature growth 2003-02-11
6503773 Low threading dislocation density relaxed mismatched epilayers without high temperature growth 2003-01-07
6495868 Relaxed InxGa1−xAs buffers Mayank Bulsara 2002-12-17
6291321 Controlling threading dislocation densities in Ge on Si using graded GeSi layers and planarization 2001-09-18
6232138 Relaxed InxGa(1-x)as buffers Mayank Bulsara 2001-05-15
6171936 Method of producing co-planar Si and Ge composite substrate 2001-01-09
6107653 Controlling threading dislocation densities in Ge on Si using graded GeSi layers and planarization 2000-08-22
6039803 Utilization of miscut substrates to improve relaxed graded silicon-germanium and germanium layers on silicon Srikanth B. Samavedam 2000-03-21
5442205 Semiconductor heterostructure devices with strained semiconductor layers Daniel Brasen, Martin L. Green, Donald Monroe, Paul Silverman, Ya-Hong Xie 1995-08-15
5308444 Method of making semiconductor heterostructures of gallium arsenide on germanium Jenn-Ming Kuo, Paul Silverman, Ya-Hong Xie 1994-05-03
5285086 Semiconductor devices with low dislocation defects 1994-02-08