Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261044 | Multi-layer hardmask for defect reduction in EUV patterning | Phillip Friddle, Ekimini Anuja De Silva, Jennifer Church, Dominik Metzler, Nelson Felix | 2025-03-25 |
| 12237175 | Polymerization protective liner for reactive ion etch in patterning | Phillip Friddle, Michael Goss, Yann Mignot, Dominik Metzler | 2025-02-25 |
| 10541141 | Method for selectively etching with reduced aspect ratio dependence | Adarsh Basavalingappa, Peng Wang, Michael Goss, Prabhakara Gopaladasu, Randolph F. Knarr +2 more | 2020-01-21 |
| 10037890 | Method for selectively etching with reduced aspect ratio dependence | Adarsh Basavalingappa, Peng Wang, Michael Goss, Prabhakara Gopaladasu, Randolph F. Knarr +2 more | 2018-07-31 |
| 10002773 | Method for selectively etching silicon oxide with respect to an organic mask | Adarsh Basavalingappa, Peng Wang, Prabhakara Gopaladasu, Michael Goss | 2018-06-19 |
| 9412609 | Highly selective oxygen free silicon nitride etch | Seongjun Heo, Chih-Hsiang Wu, Ying-Ren Chen | 2016-08-09 |
| 8906810 | Pulsed dielectric etch process for in-situ metal hard mask shape control to enable void-free metallization | Ananth Indrakanti, Alan J. Jensen, Tom Choi | 2014-12-09 |
| 8668835 | Method of etching self-aligned vias and trenches in a multi-layer film stack | Ananth Indrakanti | 2014-03-11 |