Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12365987 | Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Hiroaki Hiramatsu | 2025-07-22 |
| 12139787 | Apparatus and method for cleaning reaction vessel for processing substrate | Koei KURIBAYASHI, Takaaki Noda | 2024-11-12 |
| 12053805 | Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Koei KURIBAYASHI, Kenji Kameda, Tsukasa Kamakura, Takeo Hanashima, Hiroaki Hiramatsu +5 more | 2024-08-06 |
| 11591694 | Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium | Hiroaki Hiramatsu | 2023-02-28 |
| 11170995 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Hiroaki Hiramatsu | 2021-11-09 |
| D925481 | Inlet liner for substrate processing apparatus | Toru Kagaya | 2021-07-20 |
| 10907253 | Method of manufacturing semiconductor device, substrate processing apparatus and recording medium | Hiroaki Hiramatsu | 2021-02-02 |
| D889596 | Gas nozzle for substrate processing apparatus | Yusaku OKAJIMA, Toru Kagaya, Hiroaki Hiramatsu | 2020-07-07 |
| D888196 | Gas nozzle for substrate processing apparatus | Yusaku OKAJIMA, Toru Kagaya, Hiroaki Hiramatsu | 2020-06-23 |
| D853979 | Reaction tube | Toru Kagaya, Yusaku OKAJIMA, Hiroaki Hiramatsu | 2019-07-16 |
| 9508531 | Method of manufacturing semiconductor device by alternatively increasing and decreasing pressure of process chamber | Koei KURIBAYASHI | 2016-11-29 |