Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7435978 | System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device | Takumi Ota | 2008-10-14 |
| 7368737 | Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method | Ryoichi Inanami | 2008-05-06 |
| 7283885 | Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writing | — | 2007-10-16 |
| 7264909 | Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same | — | 2007-09-04 |
| 7242014 | Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device | Takumi Ota | 2007-07-10 |
| 7202488 | Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device | Takumi Ota | 2007-04-10 |
| 7045801 | Charged beam exposure apparatus having blanking aperture and basic figure aperture | — | 2006-05-16 |
| 7011915 | Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same | — | 2006-03-14 |
| 6941008 | Pattern forming method | Atsushi Ando, Kazuyoshi Sugihara, Katsuya Okumura | 2005-09-06 |
| 6914252 | Charged beam exposure apparatus having blanking aperture and basic figure aperture | — | 2005-07-05 |
| 6897454 | Energy beam exposure method and exposure apparatus | Noriaki Sasaki | 2005-05-24 |
| 6818364 | Charged particle beam exposure apparatus and exposure method | — | 2004-11-16 |
| 6803589 | Apparatus and method applied to exposure by charged beam | — | 2004-10-12 |
| 6762421 | Charged particle beam exposure apparatus and exposure method | — | 2004-07-13 |
| 6737658 | Pattern observation apparatus and pattern observation method | Toru Koike | 2004-05-18 |
| 6703629 | Charged beam exposure apparatus having blanking aperture and basic figure aperture | — | 2004-03-09 |
| 6512237 | Charged beam exposure method and charged beam exposure apparatus | Yuichiro Yamazaki, Hideaki Abe | 2003-01-28 |
| 6507034 | Charge beam exposure apparatus, charge beam exposure method, and charge beam exposure mask | — | 2003-01-14 |
| 6376136 | Charged beam exposure method | Yuichiro Yamazaki, Hideaki Abe | 2002-04-23 |
| 6147355 | Pattern forming method | Atsushi Ando, Kazuyoshi Sugihara, Katsuya Okumura | 2000-11-14 |
| 6140654 | Charged beam lithography apparatus and method thereof | Yumi Watanabe | 2000-10-31 |
| 6093931 | Pattern-forming method and lithographic system | Kazuyoshi Sugihara, Hiromi Niiyama, Shunko Magoshi, Atsushi Ando, Shinji Sato +4 more | 2000-07-25 |
| 5994030 | Pattern-forming method and lithographic system | Kazuyoshi Sugihara, Hiromi Niiyama, Shunko Magoshi, Atsushi Ando, Shinji Sato +4 more | 1999-11-30 |
| 5989759 | Pattern forming method using alignment from latent image or base pattern on substrate | Atsushi Ando, Kazuyoshi Sugihara, Katsuya Okumura | 1999-11-23 |
| 5933211 | Charged beam lithography apparatus and method thereof | Yumi Watanabe | 1999-08-03 |