SI

Seiji Inumiya

KT Kabushiki Kaisha Toshiba: 49 patents #354 of 21,451Top 2%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
TS Toshiba Electronic Devices & Storage: 1 patents #470 of 900Top 55%
Toshiba Memory: 1 patents #1,210 of 1,971Top 65%
📍 Yokkaichi, NY: #5 of 10 inventorsTop 50%
Overall (All Time): #52,671 of 4,157,543Top 2%
51
Patents All Time

Issued Patents All Time

Showing 26–50 of 51 patents

Patent #TitleCo-InventorsDate
7501335 Semiconductor device and manufacturing method of the same Katsuyuki Sekine, Yoshitaka Tsunashima, Akio Kaneko, Motoyuki Sato, Kazuhiro Eguchi 2009-03-10
7427518 Semiconductor device fabrication method and fabrication apparatus Katsuyuki Sekine, Motoyuki Sato, Akio Kaneko, Kazuhiro Eguchi 2008-09-23
7375403 Semiconductor device and method of manufacturing the same Akio Kaneko, Katsuyuki Sekine, Kazuhiro Eguchi, Motoyuki Sato 2008-05-20
7368780 Semiconductor memory device and method of manufacturing the same Masayuki Tanaka, Yoshio Ozawa, Hirokazu Ishida, Katsuaki Natori 2008-05-06
7306994 Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof Yoshitaka Tsunashima, Yasumasa Suizu, Yoshio Ozawa, Kiyotaka Miyano, Masayuki Tanaka 2007-12-11
7294878 Semiconductor memory device and method of manufacturing the same Masayuki Tanaka, Yoshio Ozawa, Hirokazu Ishida, Katsuaki Natori 2007-11-13
7282774 Semiconductor device and method for manufacturing semiconductor device Kazuhiro Eguchi, Yoshitaka Tsunashima 2007-10-16
7265427 Semiconductor apparatus and method of manufacturing the semiconductor apparatus Akio Kaneko, Kazuhiro Eguchi, Katsuyuki Sekine, Motoyuki Sato 2007-09-04
7220681 Semiconductor device and method of fabricating the same Katsuyuki Sekine, Akio Kaneko, Motoyuki Sato, Kazuhiro Eguchi 2007-05-22
7141466 Method of fabricating semiconductor device having gate insulating film comprising a silicate nitride film with interface insulating film Motoyuki Sato, Kazuhiro Eguchi, Katsuyuki Sekine, Akio Kaneko 2006-11-28
7129125 Semiconductor device and manufacturing method thereof including heating a silicon oxide in a helium gas Katsuyuki Sekine, Ichiro Mizushima 2006-10-31
7101775 Semiconductor device and method for manufacturing semiconductor device Kazuhiro Eguchi, Yoshitaka Tsunashima 2006-09-05
7091135 Method of manufacturing semiconductor device Kazuhiro Eguchi 2006-08-15
6924536 Semiconductor device and its manufacturing method Akira Nishiyama 2005-08-02
6844234 Semiconductor device and method for manufacturing semiconductor device Kazuhiro Eguchi, Yoshitaka Tsunashima 2005-01-18
6787827 Semiconductor device and method for manufacturing the same Katsuhiko Hieda, Tetsuo Matsuda, Yoshio Ozawa 2004-09-07
6784508 Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof Yoshitaka Tsunashima, Yasumasa Suizu, Yoshio Ozawa, Kiyotaka Miyano, Masayuki Tanaka 2004-08-31
6664592 Semiconductor device with groove type channel structure Tomohiro Saito, Atsushi Yagishita, Katsuhiko Hieda, Toshihiko Iinuma 2003-12-16
6515338 Semiconductor device and manufacturing method therefor Tomohiro Saito, Atsushi Yagishita, Katsuhiko Hieda, Toshihiko Iinuma 2003-02-04
6403997 Method for manufacturing semiconductor devices Katsuhiko Hieda, Tetsuo Matsuda, Yoshio Ozawa 2002-06-11
6383856 Semiconductor device and method for manufacturing the same Yoshio Ozawa 2002-05-07
6313047 MOCVD method of tantalum oxide film Kazuhide Hasebe, Yuichiro Morozumi, Dong-Kyun Choi, Takuya Sugawara, Yoshitaka Tsunashima 2001-11-06
6294481 Semiconductor device and method for manufacturing the same Yoshio Ozawa 2001-09-25
6251763 Semiconductor device and method for manufacturing same Katsuhiko Hieda, Tetsuo Matsuda, Yoshio Ozawa 2001-06-26
6054355 Method of manufacturing a semiconductor device which includes forming a dummy gate Tomohiro Saito, Atsushi Yagishita, Katsuhiko Hieda, Toshihiko Iinuma 2000-04-25