Issued Patents All Time
Showing 26–43 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8444889 | Imprint pattern forming method | Hiroshi TOKUE, Ryoichi Inanami | 2013-05-21 |
| 8419995 | Imprint method | Kentaro Matsunaga, Yukiko Kikuchi, Yoshihisa Kawamura, Eishi Shiobara, Shinichi Ito +2 more | 2013-04-16 |
| 8282868 | Semiconductor device fabrication method and pattern formation mold | Shunko Magoshi | 2012-10-09 |
| 8227267 | Template inspection method and manufacturing method for semiconductor device | Tetsuro Nakasugi, Masamitsu Itoh, Ryoichi Inanami | 2012-07-24 |
| 8221827 | Patterning method | Hiroshi TOKUE, Shinji Mikami, Takumi Ota | 2012-07-17 |
| 8206895 | Method for forming pattern and method for manufacturing semiconductor device | Shunko Magoshi | 2012-06-26 |
| 8202463 | Imprint method | Tetsuro Nakasugi, Shinji Mikami | 2012-06-19 |
| 8019462 | Imprint system and imprint method | Shinji Mikami | 2011-09-13 |
| 7854604 | Semiconductor device fabrication method and pattern formation mold | Shunko Magoshi | 2010-12-21 |
| 7856288 | Imprint system and imprint method | Shinji Mikami | 2010-12-21 |
| 7390365 | Developing method, substrate treating method, and substrate treating apparatus | Masamitsu Itoh, Hideaki Sakurai | 2008-06-24 |
| 7368735 | Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing method | — | 2008-05-06 |
| 7094522 | Developing method, substrate treating method, and substrate treating apparatus | Masamitsu Itoh, Hideaki Sakurai | 2006-08-22 |
| 7001086 | Developing method, substrate treating method, and substrate treating apparatus | Masamitsu Itoh, Hideaki Sakurai | 2006-02-21 |
| 6929903 | Developing method, substrate treating method, and substrate treating apparatus | Masamitsu Itoh, Hideaki Sakurai | 2005-08-16 |
| 6165907 | Plasma etching method and plasma etching apparatus | Hideki Kanai, Shinichi Ito | 2000-12-26 |
| 6159642 | Exposure mask and method of manufacturing thereof, and pattern data generating method for an exposure mask | Kenji Kawano, Shinichi Ito, Satoshi Tanaka, Soichi Inoue, Hideki Kanai | 2000-12-12 |
| 5792376 | Plasma processing apparatus and plasma processing method | Hideki Kanai, Masamitsu Itoh | 1998-08-11 |