SH

Shuji Hayase

KT Kabushiki Kaisha Toshiba: 28 patents #933 of 21,451Top 5%
Overall (All Time): #139,878 of 4,157,543Top 4%
28
Patents All Time

Issued Patents All Time

Showing 1–25 of 28 patents

Patent #TitleCo-InventorsDate
7812252 Dye sensitized solar cell and method for manufacturing dye sensitized solar cell Shinji Murai, Satoshi Mikoshiba, Hiroyasu Sumino 2010-10-12
7538169 Ion conductive film and fuel cell using the same Lois Hobson, Yoshihiko Nakano 2009-05-26
7196264 Dye sensitized solar cell and method for manufacturing dye sensitized solar cell Shinji Murai, Satoshi Mikoshiba, Hiroyasu Sumino 2007-03-27
7126054 Raw material kit for electrolytic composition, electrolytic composition, and dye-sensitized solar cell Shinji Murai, Hiroyasu Sumino, Satoshi Mikoshiba 2006-10-24
6936365 Ion conductive film and fuel cell using the same Lois Hobson, Yoshihiko Nakano 2005-08-30
6569595 Method of forming a pattern Yasuhiko Sato, Eishi Shiobara, Yasunobu Onishi, Yoshihiko Nakano 2003-05-27
6437090 Curing catalyst, resin composition, resin-sealed semiconductor device and coating material Shinji Murai, Shinetsu Fujieda, Rumiko Hayase, Yasuyuki Hotta 2002-08-20
6410748 Alicycli c group-containing monomer Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Takeshi Okino, Yoshihiko Nakano +1 more 2002-06-25
6384321 Electrolyte composition, photosensitized solar cell using said electrolyte composition, and method of manufacturing photosensitized solar cell Satoshi Mikoshiba, Hiroyasu Sumino, Maki Yonetsu 2002-05-07
6291129 Monomer, high molecular compound and photosensitive composition Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Takeshi Okino, Yoshihiko Nakano +1 more 2001-09-18
6270948 Method of forming pattern Yasuhiko Sato, Yoshihiko Nakano, Rikako Kani, Yasunobu Onishi, Eishi Shiobara +4 more 2001-08-07
6025117 Method of forming a pattern using polysilane Yoshihiko Nakano, Rikako Kani, Yasuhiko Sato, Seiro Miyoshi, Toru Ushirogouchi +5 more 2000-02-15
6022814 Material of forming silicon oxide film, silicon oxide film, method of forming silicon oxide film and semiconductor element Satoshi Mikoshiba, Yoshihiko Nakano 2000-02-08
6004730 Method of forming an insulating film pattern and photosensitive composition Satoshi Mikoshiba, Yoshihiko Nakano, Rikako Kani 1999-12-21
6002522 Optical functional element comprising photonic crystal Kenji Todori, Toshiro Hiraoka 1999-12-14
5994007 Pattern forming method utilizing first insulative and then conductive overlayer and underlayer Yasuhiko Sato, Atsushi Ando, Yasunobu Onishi, Yoshihiko Nakano, Rikako Kani 1999-11-30
5985513 Photosensitive composition comprising aryl-substituted polysilane and peroxide-substituted benzophenone Rikako Kani, Yoshihiko Nakano 1999-11-16
5969059 Impregnation resin composition Shinji Murai 1999-10-19
5907008 Black coloring composition, high heat resistance light-shielding component, array substrate, liquid crystal and method of manufacturing array substrate Yoshihiko Nakano, Sawako Fujioka, Takeo Ito, Satoshi Mikoshiba, Hideo Hirayama 1999-05-25
5866471 Method of forming semiconductor thin film and method of fabricating solar cell Tatsuro Beppu, Atsushi Kamata, Kenji Sano, Toshiro Hiraoka 1999-02-02
5773192 Organic silicon compound, resist, thermal polymerization composition and photopolymerization composition Shinji Murai, Yoshihiko Nakano, Ken Uchida 1998-06-30
5624788 Organic silicon compound, resist thermal polymerization composition and photopolymerization composition Shinji Murai, Yoshihiko Nakano, Ken Uchida 1997-04-29
5372908 Photosensitive composition comprising a polysilane and an acid forming compound Yoshihiko Nakano, Yukihiro Mikogami 1994-12-13
5362559 Polysilane monomolecular film and polysilane built-up film Yoshihiko Nakano, Yukihiro Mikogami, Akira Yoshizumi, Shinji Murai, Rikako Kani 1994-11-08
5198520 Polysilanes, polysiloxanes and silicone resist materials containing these compounds Yasunobu Onishi, Rumiko Horiguchi, Akiko Hirao 1993-03-30