Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5198520 | Polysilanes, polysiloxanes and silicone resist materials containing these compounds | Yasunobu Onishi, Shuji Hayase, Akiko Hirao | 1993-03-30 |
| 5063134 | Photosensitive composition | Shuzi Hayase, Yasunobu Onishi | 1991-11-05 |
| 5017453 | A silicone resist materials containing a polysiloxane and a photo-sensitive agent | Yasunobu Onishi, Shuji Hayase, Akiko Hirao | 1991-05-21 |
| 4988601 | Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol | Toru Ushirogouchi, Shuji Hayase, Yasunobu Onishi | 1991-01-29 |
| 4871646 | Polysilane compound and photosensitive composition | Shizu Hayase, Yasunobu Onishi, Toru Ushirogouchi | 1989-10-03 |
| 4828958 | Photosensitive composition and method of forming a resist pattern with copolymer of polyvinyl phenol | Shuzi Hayase, Yasunobu Onishi | 1989-05-09 |
| 4822716 | Polysilanes, Polysiloxanes and silicone resist materials containing these compounds | Yasunobu Onishi, Shuji Hayase, Akiko Hirao | 1989-04-18 |