| 9188848 |
Maskless vortex phase shift optical direct write lithography |
Ebo Croffie, Neal Callan |
2015-11-17 |
$18,907,000 |
| 8377633 |
Maskless vortex phase shift optical direct write lithography |
Ebo Croffie, Neal Callan |
2013-02-19 |
|
| 8057963 |
Maskless vortex phase shift optical direct write lithography |
Ebo Croffie, Neal Callan |
2011-11-15 |
|
| 8012873 |
Method for providing temperature uniformity of rapid thermal annealing |
— |
2011-09-06 |
|
| 7738078 |
Optimized mirror design for optical direct write |
Ebo Croffie, Neal Callan |
2010-06-15 |
$4,468,000 |
| 7634389 |
Reflectivity optimization for multilayer stacks |
Lav D. Ivanovic, Xudong XU |
2009-12-15 |
$11,994,000 |
| 7499146 |
Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping |
Kars Zeger Troost, Johannes Jacobus Matheus Baselmans, Arno Jan Bleeker, Louis John Markoya, Neal Callan |
2009-03-03 |
|
| 7372547 |
Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography |
Ebo Croffie, Neal Callan |
2008-05-13 |
$7,190,000 |
| 7313508 |
Process window compliant corrections of design layout |
Ebo Croffie, Colin D. Yates, Christopher Neville, Mario Garza, Neal Callan |
2007-12-25 |
|
| 7270942 |
Optimized mirror design for optical direct write |
Ebo Croffie, Neal Callan |
2007-09-18 |
$7,442,000 |
| 7264906 |
OPC based illumination optimization with mask error constraints |
Ebo Croffie, Mario Garza, Paul G. Filseth, Lav D. Ivanovic |
2007-09-04 |
$24,410,000 |
| 7189498 |
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process |
Ebo Croffie, Neal Callan |
2007-03-13 |
$3,947,000 |
| 6809824 |
Alignment process for integrated circuit structures on semiconductor substrate using scatterometry measurements of latent images in spaced apart test fields on substrate |
Colin D. Yates, Nicholas F. Pasch |
2004-10-26 |
$2,318,000 |
| 6759337 |
Process for etching a controllable thickness of oxide on an integrated circuit structure on a semiconductor substrate using nitrogen plasma and plasma and an rf bias applied to the substrate |
Sheldon Aronowitz, Valeriy Sukharev, John Haywood, James Kimball, Helmut Puchner +1 more |
2004-07-06 |
$2,680,000 |
| 6532585 |
Method and apparatus for application of proximity correction with relative segmentation |
Dusan Petranovic, Ranko Scepanovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch +3 more |
2003-03-11 |
$2,436,000 |
| 6499003 |
Method and apparatus for application of proximity correction with unitary segmentation |
Edwin Jones, Dusan Petranovic, Ranko Scepanovic, Richard Schinella, Nicholas F. Pasch +3 more |
2002-12-24 |
$3,887,000 |
| 6425117 |
System and method for performing optical proximity correction on the interface between optical proximity corrected cells |
Nicholas F. Pasch, Colin D. Yates, Shumay X. Dou |
2002-07-23 |
$2,841,000 |
| 6413881 |
PROCESS FOR FORMING THIN GATE OXIDE WITH ENHANCED RELIABILITY BY NITRIDATION OF UPPER SURFACE OF GATE OF OXIDE TO FORM BARRIER OF NITROGEN ATOMS IN UPPER SURFACE REGION OF GATE OXIDE, AND RESULTING PRODUCT |
Sheldon Aronowitz, John Haywood, James Kimball, Helmut Puchner, Ravindra M. Kapre |
2002-07-02 |
$10,025,000 |
| 6282696 |
Performing optical proximity correction with the aid of design rule checkers |
Mario Garza, John V. Jensen, Keith K. Chao |
2001-08-28 |
$24,182,000 |
| 6269472 |
Optical proximity correction method and apparatus |
Mario Garza, John V. Jensen, Keith K. Chao |
2001-07-31 |
$31,266,000 |
| 6174630 |
Method of proximity correction with relative segmentation |
Dusan Petranovic, Ranko Scepanovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch +3 more |
2001-01-16 |
$19,650,000 |
| 6175953 |
Method and apparatus for general systematic application of proximity correction |
Ranko Scepanovic, Dusan Petranovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch +3 more |
2001-01-16 |
$19,650,000 |
| 6109775 |
Method for adjusting the density of lines and contact openings across a substrate region for improving the chemical-mechanical polishing of a thin-film later disposed thereon |
Prabhakar P. Tripathi, Keith K. Chao, Ratan K. Choudhury, Gauri C. Das, Ashok K. Kapoor +1 more |
2000-08-29 |
$21,268,000 |
| 5900338 |
Performing optical proximity correction with the aid of design rule checkers |
Mario Garza, John V. Jensen, Keith K. Chao |
1999-05-04 |
$14,136,000 |
| 5897381 |
Method of forming a layer and semiconductor substrate |
Sheldon Aronowitz, Jon S. Owyang |
1999-04-27 |
$7,915,000 |
