| 7531059 |
Cleaning of semiconductor wafers by contaminate encapsulation |
Nicole S. Carpenter, Joseph Drennan, Alison K. Easton, Casey J. Grant, Andrew Hoadley +3 more |
2009-05-12 |
| 7081208 |
Method to build a microfilter |
Kenneth McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons +1 more |
2006-07-25 |
| 6939408 |
Method for surface preparation of workpieces utilizing fluid separation techniques |
Francis A. Abramovich, Nicole S. Carpenter, Joseph Drennan, Rick H. Gaylord, Casey J. Grant +5 more |
2005-09-06 |
| 6875286 |
Solid CO2 cleaning |
John M. Cotte, Catherine Ivers, Kenneth McCullough, Wayne M. Moreau, Robert J. Purtell +2 more |
2005-04-05 |
| 6783599 |
Method of cleaning contaminants from the surface of a substrate |
Glenn W. Gale, Frederick William Kern, Jr. |
2004-08-31 |
| 6776171 |
Cleaning of semiconductor wafers by contaminate encapsulation |
Nicole S. Carpenter, Joseph Drennan, Alison K. Easton, Casey J. Grant, Andrew Hoadley +3 more |
2004-08-17 |
| 6634371 |
Apparatus for removing contaminants from a workpiece using a chemically reactive additive |
Richard H. Gaylord, Frederick William Kern, Jr., Donald J. Martin, Harald Okorn-Schmidt, John Joseph Snyder |
2003-10-21 |
| 6565666 |
Capillary dry process and apparatus |
Russell H. Arndt, Glenn W. Gale, Frederick William Kern, Jr., Kenneth T. Settlemyer, Jr. |
2003-05-20 |
| 6355111 |
Method for removing contaminants from a workpiece using a chemically reactive additive |
Richard H. Gaylord, Frederick William Kern, Jr., Donald J. Martin, Harald Okorn-Schmidt, John Joseph Snyder |
2002-03-12 |
| 6356653 |
Method and apparatus for combined particle location and removal |
Jeffrey A. Brigante, Glenn W. Gale, Maurice R. Hevey, Frederick William Kern, Jr., Ben Kim +1 more |
2002-03-12 |
| 6276370 |
Sonic cleaning with an interference signal |
Emily E. Fisch, Glenn W. Gale, Harald Okorn-Schmidt |
2001-08-21 |
| 6000418 |
Integrated dynamic fluid mixing apparatus and method |
Frederick William Kern, Jr. |
1999-12-14 |
| 5966631 |
Forced plug processing for high aspect ratio structures |
Glenn W. Gale, Bernadette Ann Pierson |
1999-10-12 |
| 5579792 |
Apparatus for uniform cleaning of wafers using megasonic energy |
David Stanasolovich, Ronald A. Warren |
1996-12-03 |
| 5533540 |
Apparatus for uniform cleaning of wafers using megasonic energy |
David Stanasolovich, Ronald A. Warren |
1996-07-09 |
| 5427622 |
Method for uniform cleaning of wafers using megasonic energy |
David Stanasolovich, Ronald A. Warren |
1995-06-27 |
| 5294570 |
Reduction of foreign particulate matter on semiconductor wafers |
Marshall J. Fleming, Jr., Eric J. White |
1994-03-15 |
