Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7867687 | Methods and compositions for reducing line wide roughness | Huey-Chiang Liou, Hai Deng, Hok-Kin Choi | 2011-01-11 |
| 7700256 | Phenolic/alicyclic copolymers and photoresists | George G. Barclay, Ashish A. Pandya, Anthony Zampini, Gary Ganghui Teng, Zhibiao Mao | 2010-04-20 |
| 7678527 | Methods and compositions for providing photoresist with improved properties for contacting liquids | Robert Meagley, Ernisse Putna | 2010-03-16 |
| 7459260 | Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method | Manish Chandhok, Heidi Cao | 2008-12-02 |
| 7442487 | Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists | Heidi Cao, Manish Chandhok | 2008-10-28 |
| 7427463 | Photoresists with reduced outgassing for extreme ultraviolet lithography | Heidi Cao | 2008-09-23 |
| 7241560 | Basic quencher/developer solutions for photoresists | Shan Clark, Kim-Khanh Ho, James S. Clarke, Ernisse Putna, Robert Meagley | 2007-07-10 |
| 7226718 | Non-outgassing low activation energy resist | Heidi Cao, Jeanette M. Roberts | 2007-06-05 |
| 7147986 | Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages | Heidi Cao | 2006-12-12 |
| 7147985 | Resist compounds including acid labile groups having hydrophilic groups attached thereto | Ernisse Putna | 2006-12-12 |
| 7125793 | Method for forming an opening for an interconnect structure in a dielectric layer having a photosensitive material | Huey-Chiang Liou | 2006-10-24 |
| 7118847 | Polymer and photoresist compositions | Charles R. Szmanda, George G. Barclay, Peter Trefonas, III | 2006-10-10 |
| 7105266 | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same | George G. Barclay | 2006-09-12 |
| 7022454 | Monomers, polymers, methods of synthesis thereof and photoresist compositions | George G. Barclay, Joseph Mattia | 2006-04-04 |
| 7005227 | One component EUV photoresist | Heidi Cao | 2006-02-28 |
| 6864192 | Langmuir-blodgett chemically amplified photoresist | Huey-Chiang Liou, Hai Deng, Hok-Kin Choi | 2005-03-08 |
| 6849381 | Copolymers and photoresist compositions comprising same | George G. Barclay, Stefan J. Caporale, Zhibiao Mao, Joseph Mattia | 2005-02-01 |
| 6777157 | Copolymers and photoresist compositions comprising same | George G. Barclay, Stefan J. Caporale, Zhibiao Mao, Joseph Mattia | 2004-08-17 |
| 6680159 | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same | George G. Barclay | 2004-01-20 |
| 6599677 | Polymer and photoresist compositions | Charles R. Szmanda, George G. Barclay, Peter Trefonas, III | 2003-07-29 |
| 6492086 | Phenolic/alicyclic copolymers and photoresists | George G. Barclay, Ashish A. Pandya, Anthony Zampini, Gary Ganghui Teng, Zhibiao Mao | 2002-12-10 |
| 6406828 | Polymer and photoresist compositions | Charles R. Szmanda, George G. Barclay, Peter Trefonas, III | 2002-06-18 |
| 6306554 | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same | George G. Barclay | 2001-10-23 |